Patent Assignment
Reel/Frame 063133/0321
Assignment of Assignor's Interest
Recorded: 2023-03-28
Pages: 4
Assignors
TANSHO, HISANORI
Executed: 2023-02-08
TSUCHIYA, KOHSUKE
Executed: 2023-02-08
YAMAGUCHI, HIROKI
Executed: 2023-02-08
AKIZUKI, REIKO
Executed: 2023-02-08
ANDO, RYUNOSUKE
Executed: 2023-02-14
Assignee
FUJIMI INCORPORATED
1-1, CHIRYO 2-CHOME, NISHIBIWAJIMA-CHO, KIYOSU-SHI, AICHI, 452-8502, JAPAN
Covered Property
(1)
Method for Producing Wetting Agent for Semiconductor, Containing Polyvinyl Alcohol Composition, Polishing Composition Containing Wetting Agent for Semiconductor, Obtained by the Production Method, and Method for Producing Polishing Composition
Application:
18/028,920 →
Publication:
US 2023/0331930