Patent Assignment
Reel/Frame 063209/0281
Assignment of Assignor's Interest
Recorded: 2023-04-03
Pages: 7
Assignors
BUCHHOLZ, FLORIAN
Executed: 2023-02-03
HOSS, JAN
Executed: 2023-02-03
CHU, HAIFENG
Executed: 2023-02-04
LOSSEN, JAN
Executed: 2023-02-09
MIHAILETCHI, VALENTIN DAN
Executed: 2023-02-06
Assignee
INTERNATIONAL SOLAR ENERGY RESEARCH CENTER KONSTANZ E.V.
RUDOLF-DIESEL-STRASSE 15, KONSTANZ, 78467, GERMANY
Covered Property
(1)
Method for local modification of etching resistance in a silicon layer, use of this method in the production of passivation contact solar cells and thus-created solar cell
Application:
18/030,028 →
Publication:
US 2023/0369530