Patent Assignment
Reel/Frame 063680/0627
Assignment of Assignor's Interest
Recorded: 2023-05-18
Pages: 8
Assignors
KAWAHARA, HIROTOMO
Executed: 2023-03-27
AKAGI, DAIJIRO
Executed: 2023-04-06
IWAOKA, HIROAKI
Executed: 2023-03-20
UNO, TOSHIYUKI
Executed: 2023-03-22
SUEHARA, MICHINORI
Executed: 2023-03-28
TSUKIYAMA, KEISHI
Executed: 2023-03-28
Assignee
AGC INC.
5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN
Covered Property
(1)
Reflective Mask Blank for Euv Lithography, Reflective Mask for Euv Lithography, and Method for Manufacturing Same