Patent Assignment
Reel/Frame 064788/0099
Assignment of Assignor's Interest
Recorded: 2023-09-05
Pages: 4
Assignors
LU, CHIEN-HSING
Executed: 2023-08-23
TU, CHIH-CHIANG
Executed: 2023-08-23
WEN, CHIH-WEI
Executed: 2023-08-24
TSENG, HSIN-FU
Executed: 2023-09-04
HSU, TZU JENG
Executed: 2023-08-23
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
NO.8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, TAIWAN
Covered Property
(1)
Extreme Ultraviolet (Euv) Radiation Source Apparatus, Euv Lithography System, and Method for Generating Extreme Ultraviolet Radiation
Application:
18/455,655 →
Publication:
US 2024/0369939