IP Library Assignment 065410/0690
Patent Assignment
Reel/Frame 065410/0690

Assignment of Assignor's Interest

Recorded: 2023-10-31 Pages: 4
Assignors
WANG, CHIH-CHING
Executed: 2020-12-09
YANG, CHUNG-I
Executed: 2020-12-09
HO, JON-HSU
Executed: 2020-12-09
HSIEH, WEN-HSING
Executed: 2020-12-10
WU, CHUNG-WEI
Executed: 2020-12-16
WU, ZHIQIANG
Executed: 2020-12-16
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8 LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Source/Drain Silicide for Multigate Device Performance and Method of Fabricating Thereof
Application: 18/447,183 →
Publication: US 2023/0387240