Patent Assignment
Reel/Frame 066392/0006
Assignment of Assignor's Interest
Recorded: 2024-02-06
Pages: 3
Assignors
KANARIK, KEREN J.
Executed: 2019-03-20
TAN, SAMANTHA SIAMHWA
Executed: 2019-03-20
PAN, YANG
Executed: 2019-03-29
MARKS, JEFFREY
Executed: 2019-03-20
Assignee
LAM RESEARCH CORPORATION
4650 CUSHING PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property
(1)
Plasma Etching Chemistries of High Aspect Ratio Features in Dielectrics
Application:
18/431,669 →
Publication:
US 2024/0178014