Patent Assignment
Reel/Frame 066745/0040
Assignment of Assignor's Interest
Recorded: 2024-03-13
Pages: 3
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, AKASAKA BIZ TOWER, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Methods for Wet Atomic Layer Etching of Silicon Dioxide
Application:
18/602,858 →
Publication:
US 2025/0293039