Assignment of Assignor's Interest

Recorded: 2024-03-28 Pages: 3

Assignor

MARUYAMA, KEN

Executed: 2024-03-17

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Radiation-Sensitive Composition and Method of Forming Resist Pattern

Application: 18/618,304 →

Publication: US 2024/0329523

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.