IP Library › Assignment 067737/0259
Patent Assignment
Reel/Frame 067737/0259

Assignment of Assignor's Interest

Recorded: 2024-06-14 Pages: 7
Assignors
SZEMJONOV, ALEXANDRA
Executed: 2023-01-23
PATEL-BURROWS, FRANCESCA
Executed: 2023-01-18
Assignee
ILLUMINA CAMBRIDGE LIMITED
19 GRANTA PARK, GREAT ABINGTON, CAMBRIDGE, CB21 6DF, UNITED KINGDOM
Covered Property (1)
Etch-Free Photoresist Patterning in Multi-Depth Nanowells
Application: 18/530,025 →
Publication: US 2024/0219835
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 14, 2024
From: GHONGE, TANMAY; PRESCOTT, DAVID; WRIGHT, DANIEL; ROKHLENKO, YEKATERINA
To: ILLUMINA, INC.
Reel/Frame 067737/0195 →
Assignment of Assignor's Interest Jun 14, 2024
From: MOSKOWITZ, GAVRIELA
To: ILLUMINA, INC.
Reel/Frame 067737/0236 →
Assignment of Assignor's Interest Jun 14, 2024
From: ILLUMINA CAMBRIDGE LIMITED
To: ILLUMINA, INC.
Reel/Frame 067737/0927 →