Assignment of Assignor's Interest

Recorded: 2024-10-04 Pages: 6

Assignors

WATANABE, DAICHI

Executed: 2024-09-04

TOMIHAMA, MUNEHISA

Executed: 2024-09-17

NISHIKORI, KATSUAKI

Executed: 2024-09-06

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Radiation-Sensitive Resin Composition and Method of Forming Resist Pattern

Application: 18/906,361 →

Publication: US 2025/0116935

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.