Assignment of Assignor's Interest

Recorded: 2025-04-11 Pages: 6

Assignors

MARUYAMA, KEN

Executed: 2025-03-19

NISHIKORI, KATSUAKI

Executed: 2025-03-19

KIRIYAMA, KAZUYA

Executed: 2025-03-19

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Radiation-Sensitive Composition, Method of Forming Resist Pattern, and Polymer

Application: 19/176,934 →

Publication: US 2025/0237950

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.