IP Library Granted Patent US 6,937,753
Granted Patent B1
US 6,937,753 · App. 09/561,570 · Granted Aug 30, 2005

Automated wafer defect inspection system and a process of performing such inspection

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Quick Facts
Patent No.
US 6,937,753
App. No.
09/561,570
Granted
Aug 30, 2005
Kind
B1
Abstract

An automated defect inspection system has been invented and is used on patterned wafers, whole wafers, broken wafers, partial wafers, sawn wafers such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs, etc. and is specifically intended and designed for second optical wafer inspection for such defects as metalization defects (such as scratches, voids, corrosion, and bridging), diffusion defects, passivation layer defects, scribing defects, glassivation defects, chips and cracks from sawing, solder bump defects, and bond pad area defects.

Claims (17)

1. An automated system for inspecting a substrate, including a wafer in any form including whole patterned wafers, sawn wafers, broken wafers, and wafers of any kind on film frames, dies, die in gel paks, die in waffle paks, multi-chip modules often called MCMs, JEDEC trays, Auer boats, and other wafer and die package configurations for defects, the system comprising:

a wafer test plate;

a wafer provider for providing a wafer to the test plate;

a visual inspection device for visual inputting of a plurality of known good quality wafers during training and for visual inspection of other unknown quality wafers during inspection;

a low angle illuminator for providing darkfield illumination to the unknown quality wafers during inspection at an angle of less than 6° from the wafer test plate, wherein the low angle illuminator includes four pair of lasers, each pair being positioned at approximately 90 degree spacing around the wafer test plate; and

a microprocessor having processing and memory capabilities for developing a model of a good quality wafer and comparing unknown quality wafers to the model.

2. The automated system of claim 1 , wherein the low angle illuminator is at a low angle of incidence to the substrate.

3. The automated system of claim 2 , wherein the low angle of incidence is about 1°.

4. The automated system of claim 2 , wherein the low angle incidence is less than 5°.

5. An automated system for inspecting a substrate, including a wafer in any form including whole patterned wafers, sawn wafers, broken wafers, and wafers of any kind on film frames, dies, die in gel paks, die in waffle paks, multi-chip modules often called MCMs, JEDEC trays, Auer boats, and other wafer and die package configurations for defects, the system comprising:

a wafer test plate;

a wafer provider for providing a wafer to the test plate;

a visual inspection device for visual inputting of a plurality of known good quality wafers during training and for visual inspection of other unknown quality wafers during inspection;

a set of darkfield lasers for providing laser illumination to the unknown quality wafers during inspection at an angle of incidence of less than 6°, wherein the set of darkfield lasers includes four pair of adjacently positioned lasers, each pair being positioned at approximately 90 degree spacing around the wafer test plate; and

a microprocessor having processing and memory capabilities for developing a model of good quality wafer and comparing unknown quality wafers to the model.

6. The automated system of claim 5 , wherein the angle of incidence is less than 5°.

7. The automated system of claim 5 , wherein the angle of incidence is about 1°.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 20, 2012
From: AUGUST TECHNOLOGY CORPORATION
To: RUDOLPH TECHNOLOGIES, INC.
Reel/Frame 029583/0982 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 16, 2000
From: O'DELL, JEFFREY; HARLESS, MARK; VERBURGT, THOMAS; HERRMANN, STEVE
To: AUGUST TECHNOLOGY CORPORATION
Reel/Frame 010828/0929 →