Chlorotrifuorine gas generator system
View Patent ↗A ClF 3 gas generation system is provided with supply sources of chlorine ( 3 ) (for example a cylinder of compressed chlorine) and fluorine ( 4 ) (for example a fluorine generator) connected into a gas reaction chamber ( 2 ) enabling generation of ClF 3 gas. The reaction chamber has a valved outlet (C) for the supply of the ClF 3 gas to a process chamber for immediate local use.
1. A method of generating ClF 3 gas using a ClF 3 gas generation system wherein supply sources of chlorine and fluorine are connected into a gas reaction chamber enabling generation of ClF 3 gas, and the reaction chamber has a valved outlet for the supply of the ClF 3 gas, wherein the precursor gases are fed from the supply sources to the reaction chamber, a combination reaction is performed and the ClF 3 reaction is fed on to a local processing chamber or tool.
2. A method according to claim 1 wherein the gasses formed are fed into a plasma chamber using Cl 2 /F 2 gas mixture, wherein the chlorine level is between 15–35%.
3. A method according to claim 1 wherein an additional ClF x gas is provided in a holding chamber which allows immediate gas flow on demand to reduce processing time.
4. A method according to claim 1 wherein the gas lines and reactor surfaces are pre-conditioned using F 2 .
5. A method according to claim 1 wherein the gasses formed are fed into a plasma chamber using Cl 2 /F 2 gas mixture, wherein the chlorine level is between 20–30%.