IP Library Granted Patent US 6,528,431
Granted Patent Utility
US 6,528,431 · Confirmation No. 2675

METHOD FOR FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING AN OXYGEN AND HYDROGEN CATALYST

⬇ PDF
Code Description Pages PDF
2001-01-03 TRNA Transmittal of New Application 1 View
2001-01-03 SPEC Specification 82 View
2001-01-03 CLM Claims 4 View
2001-01-03 ABST Abstract 1 View
2001-01-03 DRW Drawings-only black and white line drawings 21 View
2001-01-03 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,528,431
App. No.
09/752,766
Filed
2001-01-03
Granted
2003-03-04
Pub. No.
US20010010975A1
Art Unit
2813
PTA
-121 days