IP Library › Granted Patent US 6,506,252
Granted Patent Utility
US 6,506,252 · Confirmation No. 4481

SUSCEPTORLESS REACTOR FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION

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 Code Description Pages PDF
2001-02-07 TRNA Transmittal of New Application 1 View
2001-02-07 SPEC Specification 18 View
2001-02-07 CLM Claims 5 View
2001-02-07 ABST Abstract 1 View
2001-02-07 DRW Drawings-only black and white line drawings 9 View
2001-02-07 OATH Oath or Declaration filed 2 View
2001-02-07 TRNA Transmittal of New Application 1 View
2001-02-07 SPEC Specification 18 View
2001-02-07 CLM Claims 5 View
2001-02-07 ABST Abstract 1 View
2001-02-07 DRW Drawings-only black and white line drawings 9 View
2001-02-07 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,506,252
App. No.
09/778,265
Filed
2001-02-07
Granted
2003-01-14
Pub. No.
US20020106826A1
Art Unit
1765
PTA
-5 days