IP Library › Granted Patent US 6,685,844
Granted Patent Utility
US 6,685,844 · Confirmation No. 9590

DEEP REACTIVE ION ETCHING PROCESS AND MICROELECTROMECHANICAL DEVICES FORMED THEREBY

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2011-09-22 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2011-09-22 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2011-09-15 PA.. Power of Attorney 2 View
2011-09-15 R3.73 Assignee showing of ownership per 37 CFR 3.73 6 View
2011-09-15 N417 Electronic Filing System Acknowledgment Receipt 2 View
2003-12-09 IFEE Issue Fee Payment (PTO-85B) 2 View
2003-11-10 LET. Miscellaneous Incoming Letter 2 View
2001-02-14 TRNA Transmittal of New Application 1 View
2001-02-14 SPEC Specification 17 View
2001-02-14 CLM Claims 7 View
2001-02-14 ABST Abstract 1 View
2001-02-14 DRW Drawings-only black and white line drawings 4 View
2001-02-14 OATH Oath or Declaration filed 1 View
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Quick Facts
Patent No.
US 6,685,844
App. No.
09/782,393
Filed
2001-02-14
Granted
2004-02-03
Pub. No.
US20020109207A1
Art Unit
1763
PTA
-58 days