IP Library › Granted Patent US 6,656,537
Granted Patent Utility
US 6,656,537 · Confirmation No. 1031

PLASMA ENHANCED CHEMICAL DEPOSITION WITH LOW VAPOR PRESSURE COMPOUNDS

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 Code Description Pages PDF
2013-01-15 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2013-01-15 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2013-01-02 PA.. Power of Attorney 1 View
2013-01-02 N417 Electronic Filing System Acknowledgment Receipt 2 View
2013-01-02 R3.73 Assignee showing of ownership per 37 CFR 3.73 1 View
2003-09-29 IFEE Issue Fee Payment (PTO-85B) 2 View
2001-03-19 TRNA Transmittal of New Application 2 View
2001-03-19 ADS Application Data Sheet 2 View
2001-03-19 SPEC Specification 11 View
2001-03-19 CLM Claims 5 View
2001-03-19 ABST Abstract 1 View
2001-03-19 DRW Drawings-only black and white line drawings 3 View
2001-03-19 OATH Oath or Declaration filed 5 View
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Quick Facts
Patent No.
US 6,656,537
App. No.
09/811,874
Filed
2001-03-19
Granted
2003-12-02
Pub. No.
US20020172778A1
Art Unit
1762
PTA
-16 days