IP Library › Granted Patent US 6,503,822
Granted Patent Utility
US 6,503,822 · Confirmation No. 7852

METHODS FOR INSITU PLASMA PRE-DEPOSITION WAFER TREATMENT IN CHEMICAL VAPOR DEPOSITION TECHNOLOGY FOR SEMICONDUCTOR INTEGRATED CIRCUIT APPLICATIONS

Inventor: Weimin Li
Patented Case View Patent ↗ View Publication ↗
⬇ PDF
 Code Description Pages PDF
2015-06-10 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2015-06-10 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2015-06-08 PA.. Power of Attorney 1 View
2015-06-08 R3.73 Assignee showing of ownership per 37 CFR 3.73 1 View
2015-06-08 N417 Electronic Filing System Acknowledgment Receipt 2 View
2001-04-06 TRNA Transmittal of New Application 2 View
2001-04-06 SPEC Specification 15 View
2001-04-06 CLM Claims 3 View
2001-04-06 ABST Abstract 1 View
2001-04-06 DRW Drawings-only black and white line drawings 7 View
2001-04-06 OATH Oath or Declaration filed 1 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
Patent No.
US 6,503,822
App. No.
09/828,110
Filed
2001-04-06
Granted
2003-01-07
Pub. No.
US20010012685A1
Art Unit
2818
PTA
-104 days