IP Library Granted Patent US 6,544,333
Granted Patent Utility
US 6,544,333 · Confirmation No. 5581

CHEMICAL VAPOR DEPOSITION SYSTEM FOR POLYCRYSTALLINE SILICON ROD PRODUCTION

⬇ PDF
Code Description Pages PDF
2001-04-24 TRNA Transmittal of New Application 2 View
2001-04-24 SPEC Specification 13 View
2001-04-24 CLM Claims 6 View
2001-04-24 ABST Abstract 1 View
2001-04-24 DRW Drawings-only black and white line drawings 3 View
2001-04-24 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,544,333
App. No.
09/842,276
Filed
2001-04-24
Granted
2003-04-08
Pub. No.
US20020014197A1
Art Unit
1765
PTA
-68 days