Patent Assignment
Reel/Frame 027832/0042
Assignment of Assignor's Interest
Recorded: 2012-03-08
Pages: 4
Assignor
ADVANCED SILICON MATERIALS LLC
Executed: 2012-03-08
Assignee
REC SILICON INC
3322 ROAD N NE, MOSES LAKE, WASHINGTON, 98837-9505
Covered Properties
(15)
Production of High-Purity Polycrystalline Silicon Rod for Semiconductor Applications
Patent:
5,382,419 →
Application:
07/953,480 →
Production of High-Purity Polycrystalline Silicon Rod for Semiconductor Applications
Patent:
5,478,396 →
Application:
08/296,964 →
Method for Silicon Deposition
Patent:
5,798,137 →
Application:
08/481,801 →
Silicon Deposition Reactor Apparatus
Patent:
5,810,934 →
Application:
08/487,008 →
Production of High-Purity Polycrystalline Silicon Rod for Semiconductor Applications
Patent:
36,936 →
Application:
09/133,933 →
Chemical Vapor Deposition System for Polycrystalline Silicon Rod Production
Patent:
6,221,155 →
Application:
09/212,088 →
Chemical Vapor Deposition System for Polycrystalline Silicon Rod Production
Method of Producing High-Purity Polycrystallin Silicon
Method of Producing Polycrystalline Silicon for Semiconductors from Silane Gas
Patent:
6,503,563 →
Application:
09/971,801 →
Rod Replenishment System for Use in Single Crystal Silicon Production
Method for Inducing Controlled Cleavage of Polycrystalline Silicon Rod
System for Increasing Charge Size for Single Crystal Silicon Production
Chemical Vapor Deposition System for Polycrystalline Silicon Rod Production
Process for the treatment of waste metal chlorides
Application:
10/551,517 →
Publication:
US 2006/0183958
Process for the treatment of waste metal chlorides
Application:
60/459,867 →
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.