IP Library Granted Patent US 6,355,400
Granted Patent Utility
US 6,355,400 · Confirmation No. 1517

Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed

Patented Case View Patent ↗
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Code Description Pages PDF
2001-08-20 TRNA Transmittal of New Application 4 View
2001-08-20 ABST Abstract 1 View
2001-05-07 TRNA Transmittal of New Application 1 View
2001-05-07 A.PE Preliminary Amendment 4 View
2001-05-07 SPEC Specification 72 View
2001-05-07 CLM Claims 2 View
2001-05-07 ABST Abstract 1 View
2001-05-07 DRW Drawings-only black and white line drawings 22 View
2001-05-07 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,355,400
App. No.
09/849,487
Filed
2001-05-07
Granted
2002-03-12
Art Unit
1756
PTA
0 days