IP Library Granted Patent US 6,555,295
Granted Patent Utility
US 6,555,295 · Confirmation No. 1233

RESIST PATTERN FORMING METHOD USING ANTI-REFLECTIVE LAYER, RESIST PATTERN FORMED, AND METHOD OF ETCHING USING RESIST PATTERN AND PRODUCT FORMED

Patented Case View Patent ↗
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Code Description Pages PDF
2002-08-28 TRNA Transmittal of New Application 2 View
2002-08-28 A.PE Preliminary Amendment 4 View
2002-08-28 SPEC Specification 71 View
2002-08-28 CLM Claims 9 View
2002-08-28 ABST Abstract 1 View
2002-08-28 DRW Drawings-only black and white line drawings 22 View
2002-08-28 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,555,295
App. No.
10/229,216
Filed
2002-08-28
Granted
2003-04-29
Art Unit
1756
PTA
0 days