IP Library › Granted Patent US 6,812,121
Granted Patent Utility
US 6,812,121 · Confirmation No. 2138

PROCESS FOR FORMING A LOW RESISTIVITY TITANIUM SILICIDE LAYER ON A SILICON SEMICONDUCTOR SUBSTRATE AND THE RESULTING DEVICE

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2004-04-05 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
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2004-04-05 REM Applicant Arguments/Remarks Made in an Amendment 8 View
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2003-09-26 CTNF Non-Final Rejection 7 View
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2003-07-11 IDS Information Disclosure Statement (IDS) Form (SB08) 1 View
2003-07-11 LET. Miscellaneous Incoming Letter 1 View
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2003-01-03 CTNF Non-Final Rejection 8 View
2003-01-03 892 List of references cited by examiner 1 View
2002-10-21 ELC. Response to Election / Restriction Filed 1 View
2002-10-21 REM Applicant Arguments/Remarks Made in an Amendment 2 View
2002-09-23 CTRS Requirement for Restriction/Election 4 View
2001-05-16 TRNA Transmittal of New Application 1 View
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2001-05-16 OATH Oath or Declaration filed 2 View
2001-05-16 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2001-05-16 SRFW Search information including classification, databases and other search related notes 1 View
2001-05-16 FWCLM Index of Claims 1 View
2001-05-16 TRNA Transmittal of New Application 3 View
2001-05-16 DRW Drawings-only black and white line drawings 8 View
2001-05-16 SPEC Specification 11 View
2001-05-16 CLM Claims 7 View
2001-05-16 ABST Abstract 1 View
2001-05-16 OATH Oath or Declaration filed 2 View
2001-05-16 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
Patent No.
US 6,812,121
App. No.
09/858,400
Filed
2001-05-16
Granted
2004-11-02
Pub. No.
US20030207569A1
Art Unit
2813
PTA
-202 days