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App. No. 09/864,384 · Confirmation No. 1601

ANTI-CHARGING LAYER FOR BEAM LITHOGRAPHY AND MASK FABRICATION

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2001-10-18 TRNA Transmittal of New Application 1 View
2001-10-18 DRW Drawings-only black and white line drawings 8 View
2001-05-25 TRNA Transmittal of New Application 2 View
2001-05-25 SPEC Specification 17 View
2001-05-25 CLM Claims 4 View
2001-05-25 ABST Abstract 1 View
2001-05-25 DRW Drawings-only black and white line drawings 11 View
2001-05-25 OATH Oath or Declaration filed 2 View
2001-05-25 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
App. No.
09/864,384
Filed
2001-05-25
Granted
2003-07-01
Pub. No.
US20020177083A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
-53 days