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App. No. 10/414,572 · Confirmation No. 5251

ANTI-CHARGING LAYER FOR BEAM LITHOGRAPHY AND MASK FABRICATION

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2004-05-07 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2004-05-07 SPEC Specification 1 View
2004-05-07 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2004-05-07 SPEC Specification 4 View
2004-04-07 CTMS Miscellaneous Action with shortened statutory period (SSP) 2 View
2003-12-02 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-04-15 TRNA Transmittal of New Application 3 View
2003-04-15 A.PE Preliminary Amendment 13 View
2003-04-15 SPEC Specification 16 View
2003-04-15 CLM Claims 4 View
2003-04-15 ABST Abstract 1 View
2003-04-15 DRW Drawings-only black and white line drawings 26 View
2003-04-15 OATH Oath or Declaration filed 2 View
2003-04-15 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
App. No.
10/414,572
Filed
2003-04-15
Granted
2004-08-10
Pub. No.
US20030203311A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
-33 days