IP Library › Granted Patent US 6,645,848
Granted Patent Utility
US 6,645,848 · Confirmation No. 9900

METHOD OF IMPROVING THE FABRICATION OF ETCHED SEMICONDUCTOR DEVICES

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2022-08-23 OATH Oath or Declaration filed 6 View
2022-08-23 OATH Oath or Declaration filed 5 View
2003-08-21 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-08-21 LET. Miscellaneous Incoming Letter 2 View
2001-06-01 TRNA Transmittal of New Application 2 View
2001-06-01 SPEC Specification 14 View
2001-06-01 CLM Claims 3 View
2001-06-01 ABST Abstract 1 View
2001-06-01 DRW Drawings-only black and white line drawings 7 View
2001-06-01 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,645,848
App. No.
09/872,747
Filed
2001-06-01
Granted
2003-11-11
Pub. No.
US20020182848A1
Art Unit
2822
PTA
-218 days