IP Library Granted Patent US 6,481,004
Granted Patent Utility
US 6,481,004 · Confirmation No. 3146

CIRCUIT PATTERN DESIGN METHOD,EXPOSURE METHOD, CHARGED-PARTICLE BEAM EXPOSURE SYSTEM

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Code Description Pages PDF
2001-06-12 TRNA Transmittal of New Application 3 View
2001-06-12 SPEC Specification 28 View
2001-06-12 CLM Claims 6 View
2001-06-12 ABST Abstract 1 View
2001-06-12 DRW Drawings-only black and white line drawings 7 View
2001-06-12 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,481,004
App. No.
09/878,286
Filed
2001-06-12
Granted
2002-11-12
Pub. No.
US20020010906A1
Examiner
HO, TU TU V
Art Unit
2818
PTA
-46 days