Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus
A heating and cooling apparatus with which batch processing is possible and throughput can be increased, and furthermore which is more compact and uses less energy. A substrate heating chamber and a substrate cooling chamber each capable of simultaneously holding a plurality of substrates are provided in a thermally separated state in a heating and cooling apparatus with a single vacuum processing chamber. The substrate heating chamber is equipped with a plurality of communicating or non-communicating substrate holding spaces. The substrate cooling chamber is also equipped with a plurality of communicating or non-communicating substrate holding spaces. The communicating substrate holding spaces allow the batch heat treatment of substrates, while the non-communicating substrate holding spaces allow the batch or individual processing of substrates.
1. A heating and cooling apparatus for substrates comprising:
a substrate
a substrate heating chamber which heats the substrate,
a substrate cooling chamber which cools the substrate,
a single vacuum processing chamber which accommodates both of the substrate heating chamber and the substrate cooling chamber,
a plurality of substrate holding spaces, which do not communicate with one another, provided in at least one of said substrate heating chamber and said substrate cooling chamber; and
a heating and cooling control means for
enabling at least one of individual heating of any substrates held in said non-communicating substrate holding spaces of said substrate heating chamber and
individual cooling of any substrates held in said non-communicating substrate holding spaces of said substrate cooling chamber.
2. A vacuum processing apparatus comprising:
a loading chamber adapted to load and unload substrates, and pump an interior of the loading chamber to a required pressure,
a separation chamber adapted to transport
a heating and cooling device which is separate from the loading chamber and which is configured to receive the substrates from the loading chamber or the separation chamber;
wherein the heating and cooling device comprises:
a substrate heating chamber configured to heat the substrates,
a substrate cooling chamber configured to cool the substrates, and
a single vacuum processing chamber which accommodates both of the substrate heating chamber and the substrate cooling chamber.
3. The vacuum processing apparatus according to claim 2 , further comprising thermal shielding to thermally shield said substrate heating chamber and said substrate cooling chamber from one another within said vacuum processing chamber.
4. The vacuum processing apparatus according to claim 2 , wherein
a substrate that is in said heating chamber is a glass substrate.
5. The vacuum processing apparatus according to claim 2 , further comprising a plurality of substrate holding spaces, which do not communicate with one another, provided in at least one of said substrate heating chamber and said substrate cooling chamber.
6. The vacuum processing apparatus according to claim 2 , wherein
said substrate heating chamber comprises at least one opening and closing valve for transporting substrates in and out of substrate heating chamber.
7. The vacuum processing apparatus according to claim 2 , wherein the heating and cooling device is disposed between the loading chamber and the separation chamber.
8. The vacuum processing apparatus according to claim 2 , further comprising at least two separation chambers, the heating and cooling device being arranged between one separation chamber and another separation chamber.
9. The vacuum processing apparatus according to claim 2 , wherein the heating and cooling device further comprises a substrate transportation chamber which is thermally shielded from the substrate heating chamber and the substrate cooling chamber, and through which substrates pass from the loading or separation chambers to the other.
10. The vacuum processing apparatus according to claim 9 , further comprising thermal shielding to thermally shield said substrate heating chamber and said substrate transportation chamber from one another, and second thermal shielding to thermally shield said substrate cooling chamber and said substrate transportation chamber from one another.
11. The vacuum processing apparatus according to claim 2 , wherein the heating and cooling device is partitioned into two parts by a vertical wall which thermally shields the two parts, the substrate heating chamber disposed in one of the parts, and the substrate cooling chamber disposed in the other part.
12. The vacuum processing apparatus according to claim 2 , further comprising:
a plurality of substrate holding spaces, which do not communicate with one another, provided in at least one of said substrate heating chamber and said substrate cooling chamber; and
a heating and cooling controller for
enabling at least one of individual heating of any substrates held in said non-communicating substrate holding spaces of said substrate heating chamber; or
individual cooling of any substrates held in said non-communicating substrate holding spaces of said substrate cooling chamber.