Patent Application
Utility
App. No. 09/943,499
· Confirmation No. 8165
METHOD OF MANUFACTURING PHOTOMASK, PHOTOMASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-08-31 | TRNA |
Transmittal of New Application | 4 | View | |
| 2001-08-31 | SPEC |
Specification | 58 | View | |
| 2001-08-31 | CLM |
Claims | 8 | View | |
| 2001-08-31 | ABST |
Abstract | 1 | View | |
| 2001-08-31 | DRW |
Drawings-only black and white line drawings | 24 | View | |
| 2001-08-31 | OATH |
Oath or Declaration filed | 4 | View |
Inventors
Yoshihiko Okamoto
Kodaira, JAPAN
Masamichi Kobayashi
Kodaira, JAPAN
Satoshi Momose
Higashiyamato, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/377
G03F1/56
H10D84/0186
H10D84/038
H10W20/01
G03F1/26
Prosecution
Foreign Priority
2000-331000
·
2000-10-30
·
JAPAN
Publication
- Pub. No.
- US20020052088A1
- Pub. Date
- 2002-05-02
Patent Term Adjustment
0days
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from
HITACHI, LTD.
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2011-03-25
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2001-08-31
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