IP Library › Assignment 012141/0264
Patent Assignment
Reel/Frame 012141/0264

Assignment of Assignor's Interest

Recorded: 2001-08-31 Pages: 2
Assignors
OKAMOTO, YOSHIHIKO
Executed: 2001-08-03
KOBAYASHI, MASAMICHI
Executed: 2001-08-03
MOMOSE, SATOSHI
Executed: 2001-08-03
Assignee
HITACHI, LTD.
CHIYODA-KU, 6, KANDA SURUGADAI 4-CHOME, TOKYO, JAPAN
Covered Property (1)
Method of Manufacturing Photomask, Photomask, and Method of Manufacturing Semiconductor Integrated Circuit Device
Patent: 6,432,790 →
Application: 09/943,499 →
Publication: US 2002/0052088
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 25, 2011
From: HITACHI, LTD.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 026109/0528 →