Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
View Patent ↗An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
1. An apparatus for treating an effluent fluid stream from one or more semiconductor manufacturing process tools, comprising:
a pre-treatment unit, downstream from at least one semiconductor manufacturing process tool, arranged to remove water soluble components from the effluent fluid stream;
an oxidizing unit, downstream from the pre-treatment unit, arranged to elevate the temperature of the effluent fluid stream, utilize a hydrogen source to effect destruction of at least a portion of halogen-containing components of the effluent fluid stream and effect oxidation of at least a portion of the oxidizable components of the effluent fluid stream; and
a quench unit, downstream from the oxidizing unit, arranged to lower the temperature of the effluent fluid stream, wherein water vapor from the quench unit is recycled back to the oxidizing unit for utilization as a hydrogen source to effect destruction of at least portion of the halogen-containing components of the effluent fluid stream; and
a post-treatment unit, downstream from the quench unit, arranged to remove acidic components from the effluent fluid stream.
2. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein said halogen-containing components contain fluorine.
3. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein said halogen-containing components contain chlorine.
4. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein said halogen-containing components comprise perfluorocarbons.
5. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein the pre-treatment unit is arranged to remove particulates from the effluent fluid stream.
6. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein the post-treatment unit is arranged to remove particulates from the effluent fluid stream.
7. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein the quench unit is constructed using a corrosion-resistant alloy.
8. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1 , wherein the oxidation unit is constructed using a high temperature oxidation-resistant alloy.
9. An apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools, comprising:
an oxidizing unit, downstream from at least one semiconductor manufacturing process tool, arranged to elevate the temperature of the effluent fluid stream, utilize a hydrogen source to effect destruction of at least a portion of the halogen-containing components of the effluent fluid stream and effect oxidation of at least a portion of the oxidizable components of the effluent fluid stream;
a post-treatment unit, downstream from the oxidizing unit, arranged to remove acidic components from the effluent fluid stream; and,
a quench unit, downstream from the oxidizing unit and upstream from the post-treatment unit, arranged to lower the temperature of the effluent fluid stream, wherein water vapor from the quench unit is recycled back to the oxidizing unit for utilization as a hydrogen source to effect destruction of at least portion of the halogen-containing components of the effluent fluid stream.
10. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , wherein said halogen-containing components contain fluorine.
11. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , wherein said halogen-containing components contain chlorine.
12. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , wherein said halogen-containing components comprise perfluorocarbons.
13. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , further comprising a pre-treatment unit arranged to remove particulates from the effluent fluid stream.
14. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , further comprising a post-treatment unit arranged to remove particulates from the effluent fluid stream.
15. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , wherein the quench unit is constructed using a corrosion-resistant alloy.
16. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 9 , wherein the oxidation unit is constructed using a high temperature oxidation-resistant alloy.
17. An apparatus for treating an effluent fluid stream from one or more semiconductor manufacturing process tools, comprising:
an oxidizing unit arranged to elevate the temperature of the effluent fluid stream, utilize a hydrogen source to effect destruction of at least a portion of halogen-containing components of the effluent fluid stream and effect oxidation of at least a portion of the oxidizable components of the effluent fluid stream; and
a quench unit, downstream from the oxidizing unit, arranged to lower the temperature of the effluent fluid stream, wherein water vapor from the quench unit is recycled back to the oxidizing unit for utilization as a hydrogen source to effect destruction of at least portion of the halogen-containing components of the effluent fluid stream.
18. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , wherein said halogen-containing components contain fluorine.
19. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , wherein said halogen-containing components contain chlorine.
20. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , wherein said halogen-containing components comprise perfluorocarbons.
21. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , further comprising a pre-treatment unit arranged to remove particulates from the effluent fluid stream.
22. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , further comprising a post-treatment unit arranged to remove particulates from the effluent fluid stream.
23. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , wherein the quench unit is constructed using a corrosion-resistant alloy.
24. The apparatus for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 17 , wherein the oxidation unit is constructed using a high temperature oxidation-resistant alloy.