Patent Assignment
Reel/Frame 016937/0211
Assignment of Assignor's Interest
Recorded: 2005-08-30
Pages: 20
Assignor
ADVANCED TECHNOLOGY MATERIALS, INC.
Executed: 2004-12-16
Assignee
APPLIED MATERIALS, INC.
P.O. BOX 450A, LEGAL AFFAIRS DEPARTMENT-M/S 2061, SANTA CLARA, CALIFORNIA, 95052
Covered Properties
(66)
Turbulent Incineration of Combustible Materials Supplied in Low Pressure Laminar Flow
Patent:
4,661,056 →
Application:
06/839,668 →
Flame Arresting Conduit Section, Combustor and Method
Patent:
4,973,451 →
Application:
07/196,956 →
Sprinkler
Patent:
4,917,305 →
Application:
07/240,479 →
Copper Sulfate Absorption Mass to Remove a SH3, PH3, B2, H6, GEH4 and SIH4
Patent:
5,024,823 →
Application:
07/279,851 →
Hydrodynamic Fume Scrubber
Patent:
5,011,520 →
Application:
07/451,306 →
Process for Sorption of Hazardous Waste Products from Exhaust Gas Streams
Patent:
5,320,817 →
Application:
07/937,243 →
Scrubber Sterilization System
Patent:
5,397,546 →
Application:
08/102,100 →
Method for Concentration and Recovery of Halocarbons from Effluent Gas Streams
Patent:
5,622,682 →
Application:
08/395,162 →
Flashback Protection Apparatus and Method for Suppressing Deflagration in Combustion-Susceptible Gas Flows
Patent:
5,676,712 →
Application:
08/441,774 →
Air Purification Method
Patent:
5,756,047 →
Application:
08/572,328 →
Point-Of-Use Catalytic Oxidation Apparatus and Method for Treatment of Voc-Containing Gas Streams
Patent:
5,914,091 →
Application:
08/602,134 →
Metallo-Oxomeric Scrubber Compositions
Patent:
5,777,058 →
Application:
08/654,780 →
System for Stabilization of Pressure Perturbations from Oxidation Systems for Treatment of Process Gases from Semiconductor Manufacturing Operations
Patent:
5,873,388 →
Application:
08/659,865 →
Flow-Stabilized Wet Scrubber System for Treatment of Process Gases from Semiconductor Manufacturing Operations
Patent:
5,851,293 →
Application:
08/708,256 →
Method and Apparatus for Concentration and Recovery of Halocarbons from Effluent Gas Streams
Patent:
5,779,998 →
Application:
08/759,578 →
Effluent Gas Stream Treatment System Having Utility for Oxidation Treatment of Semiconductor Manufacturing Effluent Gases
Patent:
5,955,037 →
Application:
08/775,838 →
Clog-Resistant Entry Structure for Introducing a Particulate Solids-Containing and/or Solids-Forming Gas Stream to a Gas Processing System
Patent:
5,846,275 →
Application:
08/778,386 →
Weeping Weir Gas/Liquid Interface Structure
Patent:
5,833,888 →
Application:
08/778,396 →
Clog-Resistant Entry Structure for Introducing a Particle Solids-Containing and/or Solids-Forming Gas Stream to a Gas Processing System
Patent:
5,935,283 →
Application:
08/857,448 →
Alternating Wash/Dry Water Scrubber Entry
Patent:
5,882,366 →
Application:
08/870,705 →
Apparatus and Method for Controlled Decomposition Oxidation of Gaseous Pollutants
Patent:
6,153,150 →
Application:
09/005,856 →
Fluid Flow Inlet
Application:
09/037,770 →
Chamber Cleaning Mechanism
Patent:
6,182,325 →
Application:
09/041,054 →
Integrated Ion Implant Scrubber System
Apparatus and Method for Point-of-Use Abatement of Fluorocompounds
Application:
09/086,033 →
Publication:
US 2001/0009652
Apparatus and Method for Point-of-Use Treatment of Effluent Gas Streams
Patent:
6,759,018 →
Application:
09/212,107 →
Apparatus and Method for Controlled Decomposition Oxidation of Gaseous Pollutants
Patent:
6,464,944 →
Application:
09/228,706 →
Advanced Apparatus and Method for Abatement of Gaseous Pollutants
Patent:
6,261,524 →
Application:
09/295,182 →
Effluent Gas Stream Treatment System Having Utility for Oxidation Treatment of Semiconductor Manufacturing Effluent Gases
Patent:
6,322,756 →
Application:
09/307,058 →
Effluent Gas Stream Treatment System Having Utility for Oxidation Treatment of Semiconductor Manufacturing Effluent Gases
Patent:
6,333,010 →
Application:
09/400,662 →
Fluorine Abatement Using Steam Injection in Oxidation Treatment of Semiconductor Manufacturing Effluent Gases
Patent:
6,423,284 →
Application:
09/420,080 →
Abatement of Effluent from Chemical Vapor Deposition Processes Using Ligand Exchange Resistant Metal-Organic Precursor Solutions
Patent:
6,500,487 →
Application:
09/420,107 →
Abatement of Effluents from Chemical Vapor Deposition Processes Using Organometallicsource Reagents
Patent:
6,391,385 →
Application:
09/420,108 →
Ceramic Composition Having High Adsorptive Capacity for Oxygen at Elevated Temperature
Patent:
6,365,535 →
Application:
09/433,610 →
High Temperature Pressure Swing Adsorption System for Separation of Oxygen-Containing Gas Mixtures
Patent:
6,361,584 →
Application:
09/433,619 →
Chamber Cleaning Mechanism
Patent:
6,544,482 →
Application:
09/525,221 →
Apparatus and Process for the Abatement of Semiconductor Manufacturing Effluents Containing Fluorine Gas
Patent:
6,905,663 →
Application:
09/551,279 →
In-Situ Air Oxidation Treatment of Mocvd Process Effluent
Patent:
6,491,884 →
Application:
09/717,439 →
Atmospheric Pressure Plasma Enhanced Abatement of Semiconductor Process Effluent Species
Oxygen Enhanced Cda Modification to a Cdo Integrated Scrubber
Abatement of Effluents from Chemical Vapor Deposition Processes Using Organometallicsource Reagents
Method for Abatement of Gaseous Pollutants
Method for Carbon Monoxide Reduction During Thermal/Wet Abatement of Organic Compounds
Effluent Gas Stream Treatment System Having Utility for Oxidation Treatment of Semiconductor Manufacturing Effluent Gases
Method for Decomposition Oxidation of Gaseous Pollutants
Integrated Ion Implant Scrubber System
Method for Carbon Monoxide Reduction During Thermal/Wet Abatement of Organic Compounds
Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases
Application:
10/150,468 →
Publication:
US 2002/0159924
Gas Recovery System to Improve the Efficiency of Abatementand/or Implement Reuse/Reclamation
Application:
10/249,294 →
Publication:
US 2004/0187683
Abatement System Targeting a by-Pass Effluent Stream of a Semiconductor Process Tool
Gas Processing System Comprising a Water Curtain for Preventing Solids Deposition of Interior Walls Thereof
Application:
10/249,703 →
Publication:
US 2004/0216610
Abatement of Effluent from Chemical Vapor Deposition Processes Using Ligand Exchange Resistant Metal-Organic Precursor Solutions
Chamber Cleaning Mechanism
Method and Apparatus for the Abatement of Toxic Gas Components from a Semiconductor Manufacturing Process Effluent Stream
Integrated System and Process for Effluent Abatement and Energy Generation
Abatement of Effluents from Chemical Vapor Deposition Processes Using Organometallic Source Reagents
Low pressure drop canister for fixed bed scrubber applications and method of using same
Application:
10/370,159 →
Publication:
US 2004/0159235
Freewire System for Suppression of Particulate Deposition and Accumulation on Processing Chamber Walls
Application:
10/379,850 →
Publication:
US 2004/0175301
Scrubber system for pretreatment of an effluent waste stream containing arsenic
Application:
10/390,475 →
Publication:
US 2004/0185661
Apparatus and method for point-of-use treatment of effluent gas streams
Application:
10/665,861 →
Publication:
US 2004/0101460
Chemisorbent system for abatement of effluent species
Application:
10/665,870 →
Publication:
US 2005/0061147
Gas-using facility including portable dry scrubber system and/or over-pressure control arrangement
Application:
10/693,413 →
Publication:
US 2005/0089455
Method and apparatus for the recovery of volatile organic compounds and concentration thereof
Application:
10/720,398 →
Publication:
US 2005/0109207
Apparatus and Method for Controlled Combustion of Gaseous Pollutants
Apparatus for point-of-use treatment of effluent gas streams
Application:
10/849,435 →
Publication:
US 2004/0213721
Method and Apparatus for the Abatement of Toxic Gas Components from a Semiconductor Manufacturing Process Effluent Stream
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
Apr 18, 1986
From: WALKER, JAY; C-THREE PARTNERSHIP; VICKERY, EARL; YATES, MARK
To: AMERICAN HOECHST CORPORATION, A CORP OF DELAWARE
Reel/Frame 004535/0869 →
Assignment of Assignors Interest.
May 20, 1988
From: VICKERY, EARL
To: HOECHST CELANESE CORPORATION
Reel/Frame 006166/0085 →
Assignment of Assignors Interest.
Dec 15, 1989
From: CARR, WILLIAM J.; KRUMMEN, RAYMOND S.
To: VECTOR TECHNICAL GROUP, INC.
Reel/Frame 005209/0304 →
Assignment of Assignors Interest.
Apr 3, 1991
From: GOKCEK, CETIN
To: MESSER GRIESHEIM GMBH
Reel/Frame 005652/0562 →
Assignment of Assignors Interest.
Aug 28, 1992
From: HARDWICK, STEVEN; MC MANUS, JAMES V.
To: NOVAPURE CORPORATION, A CORP. OF DE
Reel/Frame 006244/0248 →
Assignment of Assignors Interest.
Sep 24, 1992
From: HOECHST CELANESE CORPORATION
To: MESSER GRIESHEIM INDUSTRIES
Reel/Frame 006271/0029 →
Assignment of Assignors Interest.
Feb 22, 1993
From: VECTOR TECHNICAL GROUP INC.
To: SILICON VALLEY BANK
Reel/Frame 006425/0223 →
Assignment of Assignor's Interest
Sep 1, 1993
From: WEST, DONALD E.; WICKHAM, RICHARD E.
To: ADVANCED CHEMICAL SYSTEMS INTERNATIONAL INCORPORATED
Reel/Frame 006716/0055 →
Assignment of Assignor's Interest
May 15, 1995
From: ANDERSON, LAWRENCE B.
To: ATMI ECOSYS CORPORATION
Reel/Frame 007776/0614 →
Assignment of Assignor's Interest
Mar 22, 1996
From: WEST, DONALD E.; WICKHAM, RICHARD E.
To: ADVANCED CHEMICAL SYSTEMS, INC.
Reel/Frame 007859/0550 →
Assignment of Assignor's Interest
Jun 7, 1996
From: CARPENTER, KENT H.
To: ATMI ECOSSY CORPORATION
Reel/Frame 008030/0610 →
Assignment of Assignor's Interest
Jul 29, 1996
From: HOLST, MARK R.; OLANDER, W. KARL; TOM, GLENN M.
To: ATMI ECOSYS CORPORATION
Reel/Frame 008064/0555 →
Assignment of Assignor's Interest
Sep 30, 1996
From: NOVAPURE CORPORATION
To: ATMI ECOSYS CORPORATION
Reel/Frame 008159/0965 →
Assignment of Assignor's Interest
Dec 23, 1996
From: SILICON VALLEY BANK
To: ATMI ECOSYS CORPORATION
Reel/Frame 008283/0316 →
Assignment of Assignor's Interest
Dec 31, 1996
From: ARYA, PRAKASH V.; HOLST, MARK; CARPENTER, KENT; LANE, SCOTT
To: ATMI ECOSYS CORPORATION
Reel/Frame 008390/0156 →
Assignment of Assignor's Interest
Dec 31, 1996
From: HOLST, MARK; CARPENTER, KENT; ARYA, PRAKASH V.; LANE, SCOTT
To: ATMI ECOSYS CORPORATION
Reel/Frame 008387/0516 →
Assignment of Assignor's Interest
Dec 31, 1996
From: LANE, SCOTT; HOLST, MARK
To: ATMI ECOSYS CORPORATION
Reel/Frame 008394/0938 →
Assignment of Assignor's Interest
Oct 6, 1997
From: LANE, SCOTT; SHAH, DINESH M.; COLMAN, RONALD; HEADING, LIAM R.
To: ATMI ECOSYS CORPORATION
Reel/Frame 008745/0367 →
Assignment of Assignor's Interest
Jan 30, 1998
From: HOECHST CELANESE CORPORATION
To: MESSER GRIESHEIM INDUSTRIES
Reel/Frame 009157/0742 →
Assignment of Assignor's Interest
Jan 30, 1998
From: ADVANCED TECHNOLOGY MATERIALS, INC.
To: ATMI ECOSYS CORPORATION
Reel/Frame 008989/0895 →
Assignment of Assignor's Interest
Jan 30, 1998
From: MESSER GRIESHEIM INDUSTRIES, INC.
To: ADVANCED TECHNOLOGY MATERIALS, INC.
Reel/Frame 008989/0900 →
Assignment of Assignor's Interest
Feb 5, 1998
From: SWEENEY, JOSEPH D.; ARYA, PRAKASH V.; HOLST, MARK; LANE, SCOTT
To: ATMI ECOSYS CORPORATION
Reel/Frame 008984/0441 →
Assignment of Assignor's Interest
Mar 26, 1998
From: NOVAPURE CORPORATION
To: ATMI ECOSYS CORPORATION
Reel/Frame 009069/0242 →
Assignment of Assignor's Interest
May 15, 1998
From: MOORE, ROBERT; GETTY, JAMES; SAFIULLIN, RAVIL
To: DELATECH, INC.
Reel/Frame 009200/0198 →
Assignment of Assignor's Interest
May 21, 1998
From: HERMAN, TIMOTHY L.
To: DELATECH INCORPORATED
Reel/Frame 009200/0281 →