IP Library Granted Patent US 6,884,330
Granted Patent B2
US 6,884,330 · App. 09/999,879 · Granted Apr 26, 2005

Counter plate electrode with self adjusting z-axis

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Quick Facts
Patent No.
US 6,884,330
App. No.
09/999,879
Granted
Apr 26, 2005
Kind
B2
Abstract

The present invention relates to a method and apparatus for properly and consistently spacing an electrode from a workpiece while electrochemically etching (ECM) grooves to a precise depth in a surface of the workpiece to form a fluid dynamic bearing. The electrode is especially designed for imparting a grooved pattern to a flat surface, the electrode comprising a surface carrying the pattern to be formed on the flat surface, and a central rod extending a short distance above the electrode surface. The central rod precisely sets the gap between the electrode and the flat surface. The electrode is adapted to be electrically connected to a power supply so that the electrode serves as the cathode, and the flat work piece serves as the anode in an ECM system.

Claims (20)

1. A device for accurately forming grooves of a precise pre-selected depth on a flat surface comprising an electrode for use in an ECM (electro chemical machining system), the electrode being designed for imparting a grooved pattern to a flat surface, the electrode comprising a surface carrying the pattern to be formed on the flat surface, and a center rod extending a short distance above the electrode surface, the center rod is the only spacer used for precisely setting a gap between the electrode and the flat surface.

2. A device as claimed in claim 1 wherein the electrode is adapted to be electrically connected to a power supply so that the electrode serves as the cathode, and the flat work piece serves as the anode in an ECM system.

3. A device as claimed in claim 1 wherein the surface of the electrode is annular in shape.

4. A device as claimed in claim 1 wherein a pattern to be formed on the flat surface is defined by raised lands of electrically conductive material formed on the surface of the electrode carrying the pattern.

5. A device as claimed in claim 4 wherein the raised lands of the electrically conductive material are separated by insulating material.

6. A device as claimed in claim 4 wherein the raised lands of the electrically conductive material are separated and surrounded by insulated material of equal height to the lands of the electrically conductive material.

7. A device as claimed in claim 4 wherein the center rod of the electrode comprises an electrically inert material.

8. A device as claimed in claim 7 wherein the center rod of the electrode comprises ceramic material.

9. A device for accurately forming grooves of a precise pre-selected depth on a flat surface comprising an electrode for use in an ECM (electro chemical machining system), the electrode being designed for imparting a grooved pattern to a flat surface, the electrode comprising a surface carrying the pattern to be formed on the flat surface, and a center rod extending a short distance above the electrode surface, the center rod precisely setting a gap between the electrode and the flat surface wherein the center rod is grooved threaded into the electrode so that the height of the central rod above the electrode surface can be adjusted.

10. A device for accurately forming grooves of a precise pre-selected depth on a flat surface comprising an electrode for use in an ECM (electro chemical maching system), the electrode being designed for imparting a grooved pattern to a flat surface, the electrode comprising a surface carrying the pattern to be formed on the flat surface, and a center rod extending a short distance above the electrode surface, the center rod precisely setting a gap between the electrode and the flat surface, wherein the center rod is movable axially within an outer section of the electrode.

11. A system for defining a groove pattern of a precise depth on a flat surface of a workpiece utilitizing electrochemical machining (ECM) comprising a first device for supporting the flat surface of the workpiece facing an electrode, and an electrode designed for imparting a grooved pattern to a flat surface, the electrode comprising an outer section ending in a surface carrying the pattern to be formed on the flat surface, and an electrically inert center rod extending a short distance above the electrode surface, the center rod is the only spacer used for precisely setting a first gap between the electrode and the flat surface.

12. A system as claimed in claim 11 comprising an inlet through said electrode outer section connected to a second gap between the center rod and the electrode outer section, said second gap extending axially to a surface of the electrode facing flat surface so that electrolyte can be supplied to the first gap defined between the electrode and the flat surface.

13. A system for defining a groove pattern of a precise depth on a flat surface of a workpiece utilitizing electrochemical machining (ECM) comprising a first device for supporting the flat surface of the workpiece facing an electrode, and an electrode designed for imparting a grooved pattern to a flat surface, the electrode comprising an outer section ending in a surface carrying the pattern to be formed on the flat surface, and an electrically inert center rod extending a short distance above the electrode surface, the center rod precisely setting a first gap between the electrode and the flat surface, wherein the center rod is movable axially within the outer section of the electrode.

14. A system as defined in claim 13 including a screw threaded into a center bore in the, electrode outer section and movable axially to move the center rod, thereby adjusting a second gap between the center rod and the electrode outer section.

15. A system as claimed in claim 14 wherein the screw is integrated with the center rod, threads being defined on the interior of the bore to position the rod.

16. A system as claimed in claim 15 wherein the center rod comprises an electrically inert material.

17. A system as claimed in claim 16 wherein a pattern to be formed on the flat surface is defined by raised lands of electrically conductive material formed on the surface of the electrode carrying the pattern.

18. A system as claimed in claim 17 wherein the raised lands of the electrically conductive material are separated and surrounded by insulated material of equal height to the lands of the electrically conductive material.

19. A system defining a groove pattern of a precise depth on a flat surface of a workpiece utilizing electrochemical machining (ECM) comprising a first device for supporting the flat surface of the workpiece facing an electrode, electrode facing the flat surface for imparting a grooved pattern to the flat surface, and an electrically inert center rod extending a short distance above a surface of the electrode, the center rod being grooved threaded into the electrode so that the height of the center rod above the electrode surface can be adjusted.

20. A system of claim 19 wherein the electrode comprises an outer section ending in a surface carrying the pattern to be formed on the flat surface of the workpiece, and the center rod is adapted to precisely set the gap between the electrode and the flat surface.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Jul 23, 2025
From: THE BANK OF NOVA SCOTIA
To: SEAGATE TECHNOLOGY PUBLIC LIMITED COMPANY; SEAGATE TECHNOLOGY; SEAGATE TECHNOLOGY HDD HOLDINGS; I365 INC.; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL; SEAGATE HDD CAYMAN; SEAGATE TECHNOLOGY (US) HOLDINGS, INC.
Reel/Frame 072193/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS Recorded Jul 19, 2013
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT AND SECOND PRIORITY REPRESENTATIVE
To: SEAGATE TECHNOLOGY LLC; EVAULT INC. (F/K/A I365 INC.); SEAGATE TECHNOLOGY INTERNATIONAL; SEAGATE TECHNOLOGY US HOLDINGS, INC.
Reel/Frame 030833/0001 →
SECURITY AGREEMENT Recorded Mar 24, 2011
From: SEAGATE TECHNOLOGY LLC
To: THE BANK OF NOVA SCOTIA, AS ADMINISTRATIVE AGENT
Reel/Frame 026010/0350 →
RELEASE Recorded Jan 19, 2011
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: SEAGATE TECHNOLOGY HDD HOLDINGS; MAXTOR CORPORATION; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL
Reel/Frame 025662/0001 →
SECURITY AGREEMENT Recorded May 15, 2009
From: MAXTOR CORPORATION; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT AND FIRST PRIORITY REPRESENTATIVE; WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT AND SECOND PRIORITY REPRESENTATIVE
Reel/Frame 022757/0017 →
RELEASE OF SECURITY INTERESTS IN PATENT RIGHTS Recorded Jan 4, 2006
From: JPMORGAN CHASE BANK, N.A. (FORMERLY KNOWN AS THE CHASE MANHATTAN BANK AND JPMORGAN CHASE BANK), AS ADMINISTRATIVE AGENT
To: SEAGATE TECHNOLOGY LLC
Reel/Frame 016967/0001 →