IP Library Patent Application 10006949
Patent Application Utility Small
App. No. 10/006,949 · Confirmation No. 2759

METHOD FOR FORMING TA2O5 DIELECTRIC LAYER USING PLASMA ENHANCED ATOMIC LAYER DEPOSITION

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
⬇ PDF
Code Description Pages PDF
2013-06-27 IMIS Miscellaneous Internal Document 1 View
2001-12-04 TRNA Transmittal of New Application 4 View
2001-12-04 SPEC Specification 7 View
2001-12-04 CLM Claims 3 View
2001-12-04 ABST Abstract 1 View
2001-12-04 DRW Drawings-only black and white line drawings 4 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
App. No.
10/006,949
Filed
2001-12-04
Granted
2003-03-25
Pub. No.
US20020086476A1
Examiner
LE, DUNG ANH
Art Unit
2819
PTA
0 days