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App. No. 10/011,420 · Confirmation No. 8395

Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2001-12-04 TRNA Transmittal of New Application 5 View
2001-12-04 A.PE Preliminary Amendment 2 View
2001-12-04 SPEC Specification 38 View
2001-12-04 CLM Claims 9 View
2001-12-04 ABST Abstract 1 View
2001-12-04 DRW Drawings-only black and white line drawings 20 View
2001-12-04 OATH Oath or Declaration filed 2 View
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Quick Facts
App. No.
10/011,420
Filed
2001-12-04
Pub. No.
US20020047089A1
Examiner
LUU, THANH X
Art Unit
2878