Patent Application
Utility
App. No. 10/013,481
· Confirmation No. 2960
Method for correcting spherical aberration of a projection lens in an exposure system
Inventor:
Seiji Matsuura
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-12-13 | TRNA |
Transmittal of New Application | 1 | View | |
| 2001-12-13 | SPEC |
Specification | 19 | View | |
| 2001-12-13 | CLM |
Claims | 2 | View | |
| 2001-12-13 | ABST |
Abstract | 1 | View | |
| 2001-12-13 | DRW |
Drawings-only black and white line drawings | 6 | View | |
| 2001-12-13 | OATH |
Oath or Declaration filed | 3 | View |
Inventors
Seiji Matsuura
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
355/55
G03F7/706
G02B27/0025
G03B21/00
Prosecution
- Examiner
- FULLER, RODNEY EVAN
- Art Unit
- 2851
- Docket No.
- Q67693
- Confirmation No.
- 2960
Foreign Priority
2000-383166
·
2000-12-18
·
JAPAN
Publication
- Pub. No.
- US20020075458A1
- Pub. Date
- 2002-06-20
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-25
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Quick Facts
- App. No.
- 10/013,481
- Filed
- 2001-12-13
- Pub. No.
- US20020075458A1
- Examiner
- FULLER, RODNEY EVAN
- Art Unit
- 2851
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