Densifying hollow porous substrates by chemical vapor infiltration
A porous substrate having a concave inside face and an outside face is disposed in an enclosure, and reactive gas is introduced into the enclosure to densify the substrate. At least a portion of the gas is divided into two non-zero fractions. The first fraction of the gas is fed to the inside face of the substrate. The second fraction of the gas is fed to only the outside face of the substrate. Alternatively, the first fraction of the gas is fed via a tooling extending into an inside volume defined by the concave inside face of the substrate.
1. A method of densifying hollow bowl-shaped porous substrates by chemical vapor infiltration, the substrates each having an inside volume defined by a concave inside face and having an opposite convex outside face, the method comprising the steps of:
placing at least one hollow substrate to be densified in an enclosure;
admitting a reactive gas into the enclosure through a gas inlet opening into the enclosure at one end thereof;
causing the gas to flow through the enclosure between said reactive gas inlet and an effluent gas outlet at another end of the enclosure;
dividing at least a portion of the reactive gas flow entering the enclosure into first and second non-zero fractions, wherein the first fraction of the reactive gas flow is fed to the inside face of the at least one substrate and the second fraction of the reactive gas flow is fed to only the outside face of the at least one substrate; and
guiding the first fraction of the reactive gas flow feeding the inside face of the at least one substrate by means of a tooling directing the gas into the inside volume of the substrate so that the concave inside face of the substrate is swept in full by the first fraction of the total reactive gas flow admitted into the enclosure.
2. A method according to claim 1 , wherein the guidance of a portion of the gas flow is provided by passages formed through a body housed inside the volume defined by the concave inside face of said at least one substrate.
3. A method according to claim 1 , wherein the fraction of the total reactive gas flow sweeping over a face of said at least one substrate placed in the enclosure is not less than 5%.
4. A method according to claim 1 , wherein the fraction of the total reactive gas flow sweeping over a face of said at least one substrate placed in the enclosure is not less than 10%.
5. A method according to claim 4 , characterized in that a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure.
6. A method according to claim 1 , wherein a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure.
7. A method according to claim 6 , wherein the fraction of the total reactive gas flow sweeping over a face of each substrate placed in the enclosure is not less than 5%.
8. A method according to claim 6 , wherein the fraction of the total reactive gas flow sweeping over a face of each substrate placed in the enclosure is not less than 10%.
9. A method according to claim 1 , wherein said guidance of a portion of the gas flow is provided by a wall portion which penetrates into the volume defined by the concave inside face of said at least one substrate.
10. A method according to claim 9 , wherein said portion of the gas flow is guided in part by a cylindrical wall portion to the vicinity of an end wall of the inside volume of said at least one substrate.
11. A method according to claim 10 , wherein a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure.
12. A method according to claim 9 , wherein a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure.
13. A method according to claim 1 , wherein:
a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure;
the fraction of the total reactive gas flow sweeping over a face of each substrate placed in the enclosure is not less than 5%;
the guidance of a portion of the gas flow is provided at least in part by a cylindrical wall portion which penetrates into the volume defined by the concave inside face of the or each substrate, to the vicinity of the end wall of the or each substrate.
14. A method according to claim 1 , wherein:
a plurality of substrates are densified simultaneously, the substrates being placed inside the enclosure in alignment in the general flow direction of the gas through the enclosure;
the fraction of the total reactive gas flow sweeping over a face of each substrate placed in the enclosure is not less than 5%;
the guidance of a portion of the gas flow is provided by passages formed through a body housed inside the volume defined by the concave inside face of each substrate.
15. A method of densifying a hollow bowl-shaped porous substrate by chemical vapor infiltration, the substrate having a concave inside face, an opposite convex outside face and an edge defining an opening for accessing an inside volume defined by the concave inside face, the method comprising:
placing the hollow substrate to be densified in an enclosure;
admitting a reactive gas into the enclosure through a gas inlet opening into the enclosure;
causing the gas to flow through the enclosure between said gas inlet and an effluent gas outlet;
directing a first non-zero portion, but not all, of the reactive gas flowing through the enclosure into the inside volume of the substrate by means of a tooling extending into the inside volume of the substrate, wherein the concave inside face of the substrate is swept in full by the first portion of the reactive gas flow; and
feeding a second non-zero portion of the reactive gas flowing through the enclosure to the outside face of the substrate.
16. A method according to claim 15 , further comprising:
placing at least one other hollow substrate to be densified in the enclosure;
for each of the other hollow substrates, directing a respective first non-zero portion, but not all, of the reactive gas flowing through the enclosure into the inside volume of the other substrate, wherein the concave inside face of the other substrate is swept in full by the respective first fraction of the reactive gas flow; and
feeding a respective second non-zero portion of the reactive gas flowing through the enclosure to the outside face of the other substrate.
17. A method according to claim 16 , wherein feeding the second non-zero portion of the reactive gas comprises feeding the second non-zero portion of the reactive gas to only the outside face of the substrate.
18. A method according to claim 15 , wherein feeding the second non-zero portion of the reactive gas comprise feeding the second non-zero portion of the reactive gas to only the outside face of the substrate.