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App. No. 10/055,535 · Confirmation No. 9156

Polishing composition having organic polymer particles

Expressly Abandoned -- During Examination View Publication ↗
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 Code Description Pages PDF
2002-01-23 TRNA Transmittal of New Application 1 View
2002-01-23 SPEC Specification 10 View
2002-01-23 CLM Claims 2 View
2002-01-23 ABST Abstract 1 View
2002-01-23 OATH Oath or Declaration filed 2 View
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Quick Facts
App. No.
10/055,535
Filed
2002-01-23
Pub. No.
US20020173243A1
Art Unit
3723