Granted Patent
Utility
US 6,770,533
· Confirmation No. 3150
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2020-06-11 | OATH |
Oath or Declaration filed | 262 | View | |
| 2004-04-21 | IFEE |
Issue Fee Payment (PTO-85B) | 1 | View | |
| 2004-04-15 | XRUSH |
Internal Response to Printer Query from Technology Center(TC) | 2 | View | |
| 2004-02-05 | NOA |
Notice of Allowance and Fees Due (PTOL-85) | 3 | View | |
| 2004-02-05 | NOA |
Notice of Allowance and Fees Due (PTOL-85) | 1 | View | |
| 2004-02-05 | IIFW |
Issue Information including classification, examiner, name, claim, renumbering, etc. | 1 | View | |
| 2004-02-05 | SRFW |
Search information including classification, databases and other search related notes | 1 | View | |
| 2004-01-08 | A... |
Amendment/Request for Reconsideration-After Non-Final Rejection | 1 | View | |
| 2004-01-08 | CLM |
Claims | 5 | View | |
| 2004-01-08 | REM |
Applicant Arguments/Remarks Made in an Amendment | 1 | View | |
| 2003-10-16 | CTNF |
Non-Final Rejection | 5 | View | |
| 2003-10-16 | 892 |
List of references cited by examiner | 1 | View | |
| 2003-10-16 | SRFW |
Search information including classification, databases and other search related notes | 1 | View | |
| 2003-10-03 | RCEX |
Request for Continued Examination (RCE) | 3 | View | |
| 2003-09-22 | CTAV |
Advisory Action (PTOL-303) | 2 | View | |
| 2003-08-06 | A.NE |
Response After Final Action | 1 | View | |
| 2003-08-06 | CLM |
Claims | 6 | View | |
| 2003-08-06 | REM |
Applicant Arguments/Remarks Made in an Amendment | 4 | View | |
| 2003-08-06 | DRW |
Drawings-only black and white line drawings | 1 | View | |
| 2003-05-08 | CTFR |
Final Rejection | 6 | View | |
| 2003-02-28 | A... |
Amendment/Request for Reconsideration-After Non-Final Rejection | 1 | View | |
| 2003-02-28 | CLM |
Claims | 3 | View | |
| 2003-02-28 | REM |
Applicant Arguments/Remarks Made in an Amendment | 6 | View | |
| 2002-12-03 | CTNF |
Non-Final Rejection | 5 | View | |
| 2002-12-03 | 1449 |
List of References cited by applicant and considered by examiner | 1 | View | |
| 2002-02-27 | TRNA |
Transmittal of New Application | 3 | View | |
| 2002-02-27 | ADS |
Application Data Sheet | 3 | View | |
| 2002-02-27 | A.PE |
Preliminary Amendment | 5 | View | |
| 2002-02-27 | SPEC |
Specification | 35 | View | |
| 2002-02-27 | CLM |
Claims | 4 | View | |
| 2002-02-27 | ABST |
Abstract | 1 | View | |
| 2002-02-27 | DRW |
Drawings-only black and white line drawings | 24 | View | |
| 2002-02-27 | OATH |
Oath or Declaration filed | 2 | View | |
| 2002-02-27 | TRNA |
Transmittal of New Application | 3 | View | |
| 2002-02-27 | ADS |
Application Data Sheet | 3 | View | |
| 2002-02-27 | A... |
Amendment/Request for Reconsideration-After Non-Final Rejection | 1 | View | |
| 2002-02-27 | SPEC |
Specification | 1 | View | |
| 2002-02-27 | REM |
Applicant Arguments/Remarks Made in an Amendment | 3 | View | |
| 2002-02-27 | SPEC |
Specification | 35 | View | |
| 2002-02-27 | CLM |
Claims | 4 | View | |
| 2002-02-27 | ABST |
Abstract | 1 | View | |
| 2002-02-27 | DRW |
Drawings-only black and white line drawings | 24 | View | |
| 2002-02-27 | OATH |
Oath or Declaration filed | 2 | View | |
| 2002-02-27 | WFEE |
Fee Worksheet (SB06) | 2 | View | |
| 2002-02-27 | WFEE |
Fee Worksheet (SB06) | 1 | View | |
| 2002-02-27 | WCLM |
Claims Worksheet (PTO-2022) | 1 | View | |
| 2002-02-27 | FWCLM |
Index of Claims | 1 | View | |
| 2002-02-27 | SRFW |
Search information including classification, databases and other search related notes | 1 | View | |
| 2002-02-27 | IIFW |
Issue Information including classification, examiner, name, claim, renumbering, etc. | 1 | View | |
| 2002-02-27 | IDS |
Information Disclosure Statement (IDS) Form (SB08) | 2 | View |
Inventors
Yoshiaki Hisamune
Tokyo, JAPAN
Hidetoshi Nakata
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/258
H10B41/30
H10B69/00
Prosecution
- Examiner
- BOOTH, RICHARD A
- Art Unit
- 2812
- Customer No.
- 466
- Docket No.
- 8020-1002-1
- Confirmation No.
- 3150
Foreign Priority
11-014707
·
1999-01-22
·
JAPAN
Publication
- Pub. No.
- US20020102794A1
- Pub. Date
- 2002-08-01
Patent Term Adjustment
-56days
TESSERA, INC.,
INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.),
FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS),
INVENSAS CORPORATION,
TESSERA ADVANCED TECHNOLOGIES, INC,
DTS, INC.,
DTS LLC,
PHORUS, INC.,
IBIQUITY DIGITAL CORPORATION
from
ROYAL BANK OF CANADA
RELEASE OF SECURITY INTEREST
Recorded 2020-06-11
from
DIGITALOPTICS CORPORATION,
DIGITALOPTICS CORPORATION MEMS,
DTS, INC.,
DTS, LLC,
IBIQUITY DIGITAL CORPORATION,
INVENSAS CORPORATION,
PHORUS, INC.,
TESSERA ADVANCED TECHNOLOGIES, INC.,
TESSERA, INC.,
ZIPTRONIX, INC.
SECURITY INTEREST
Recorded 2016-12-02
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2014-05-13
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-06-17
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Quick Facts
- Patent No.
- US 6,770,533
- App. No.
- 10/083,611
- Filed
- 2002-02-27
- Granted
- 2004-08-03
- Pub. No.
- US20020102794A1
- Examiner
- BOOTH, RICHARD A
- Art Unit
- 2812
- PTA
- -56 days
External Links