Patent Assignment
Reel/Frame 032892/0212
Assignment of Assignor's Interest
Recorded: 2014-05-13
Received: 2014-05-13
Pages: 60
Assignor
RENESAS ELECTRONICS CORPORATION
Executed: 2014-03-18
Assignee
TESSERA ADVANCED TECHNOLOGIES, INC.
3025 ORCHARD PARKWAY, SAN JOSE, CA, 95134, UNITED STATES
Covered Properties
(100)
Time Management Using Time-Dependent Changes to Memory
Application:
14/276,793 →
Hair Shaving Apparatus with Adjustable Head Angle
Application:
61/877,990 →
Solid State Imaging Device for Imaging an Object Placed Thereon
Application:
13/550,256 →
Semiconductor Device Providing a First Electrical Conductor and a Second Electrical Conductor in One Through Hole and Method for Manufacturing the Same
Application:
13/102,749 →
Semiconductor Integrated Circuit Device
Application:
13/032,009 →
Method and Arrangement of Determining Timing Uncertainty
Application:
12/963,077 →
Etching and Cleaning Methods and Etching and Cleaning Apparatuses Used Therefor
Application:
12/954,207 →
Semiconductor Integrated Circuit Device and Manufacture Thereof
Application:
12/854,654 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
12/838,598 →
Semiconductor Device and Semiconductor Module Employing Thereof
Application:
12/820,478 →
Semiconductor Device and Method of Manufacturing the Same
Application:
12/640,766 →
Semiconductor Device and Method of Manufacturing the Same
Application:
12/483,751 →
Semiconductor Integrated Circuit Device with a Fuse Circuit
Application:
12/433,529 →
Manufacturing Process of Semiconductor Device and Semiconductor Device
Application:
12/360,466 →
Semiconductor Device, Semiconductor Wafer, and Methods of Producing the Same Device and Wafer
Application:
12/320,053 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
12/153,385 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
11/869,564 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
11/862,928 →
Semiconductor Device Including a Capacitance
Application:
11/840,612 →
Semiconductor Device and Semiconductor Wafer and a Method for Manufacturing the Same
Application:
11/834,094 →
Semiconductor Integrated Circuit Device and Manufacture Thereof
Application:
11/808,808 →
Semiconductor Device, Semiconductor Wafer, and Methods of Producing Same Device and Wafer
Application:
11/797,293 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/526,754 →
Semiconductor Device and Method for Patterning
Application:
11/504,738 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
11/432,507 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
11/430,039 →
Semiconductor Device and a Method of Manufacturing the Same
Application:
11/411,892 →
Solid State Image Pick-Up Device for Imaging an Object Placed Thereon
Application:
11/268,812 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
11/266,430 →
Nonvolatile Semiconductor Memory Device
Application:
11/251,963 →
Semiconductor Integrated Circuit Having Bonding Optional Function
Application:
11/242,876 →
Semiconductor Device Providing a First Electrical Conductor and a Second Electrical Conductor in One Through Hole and Method for Manufacturing the Same
Application:
11/168,388 →
Semiconductor Device and Semiconductor Module Employing Thereof
Application:
11/167,162 →
Soi Substrate and Method for Manufacturing the Same
Application:
11/154,514 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
11/151,231 →
Etching and Cleaning Methods and Etching and Cleaning Apparatuses Used Therefor
Application:
11/144,692 →
Semiconductor Device and Semiconductor Wafer and a Method for Manufacturing the Same
Application:
11/142,417 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
11/118,951 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
11/107,826 →
Semiconductor Device Having a Multi-Chip Stacked Structure and Reduced Thickness
Application:
11/070,089 →
Semiconductor Interconnect Structure
Application:
11/068,431 →
Semiconductor Device
Application:
11/057,495 →
Semiconductor Device Including a Capacitance
Application:
10/995,193 →
Semiconductor Memory Element, Semiconductor Device and Control Method Thereof
Application:
10/957,680 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
10/954,102 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
10/954,096 →
Field-Effect Type Semiconductor Device for Power Amplifier
Application:
10/898,257 →
Semiconductor Device
Application:
10/886,725 →
Semiconductor Integrated Circuit Device Having Particular Testing Pad Arrangement
Application:
10/873,360 →
Method of Manufacturing Semiconductor Device
Application:
10/872,501 →
Semiconductor Device and Method of Manufacturing Same
Application:
10/866,701 →
Non-Volatile Semiconductor Memory and Method of Making Same, and Semiconductor Device and Method of Making Device
Application:
10/851,350 →
Semiconductor Device and Method for Producing the Same
Application:
10/825,436 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
10/817,820 →
Method of Manufacturing a Dual Gate Semiconductor Device with a Poly-Metal Electrode
Application:
10/787,437 →
Nonvolatile Semiconductor Memory Device
Application:
10/743,783 →
Electrostatic Discharge Device
Application:
10/743,651 →
Semiconductor Device and a Method of Manufacturing the Same
Application:
10/739,319 →
Ccd Image Sensor
Application:
10/724,258 →
Master Slice Semiconductor Integrated Circuit
Application:
10/718,515 →
Etching and Cleaning Methods and Etching and Cleaning Apparatuses Used Therefor
Application:
10/665,148 →
Semiconductor Device Including N-Channel Fets and P-Channel Fets with Improved Drain Current Characteristics
Application:
10/625,616 →
Manufacturing Method of Semiconductor Integrated Circuit Device
Application:
10/623,849 →
Semiconductor Integrated Circuit and Nonvolatile Memory Element
Application:
10/610,567 →
Semiconductor Device and Manufacturing Method Thereof
Application:
10/438,887 →
Semiconductor Device
Application:
10/422,942 →
A Semiconductor Device Including an Interconnect Having Copper as a Main Component
Application:
10/387,504 →
Method of Manufacturing Semiconductor Device
Application:
10/376,694 →
Semiconductor Device and Method of Manufacturing the Same
Application:
10/355,116 →
Semiconductor Device Provided with Rewiring Layer
Application:
09/787,526 →
Semiconductor Integrated Circuit Device and Process for Manufacturing the Same
Application:
10/321,614 →
Semiconductor Device
Application:
10/309,238 →
Semiconductor device and method of manufacturing the same
Application:
10/276,776 →
Semiconductor Integrated Circuit Device and Method of Manufacturing the Same
Application:
10/294,712 →
Semiconductor Device and Method for Patterning
Application:
10/282,044 →
Semiconductor Device and Manufacturing Method for the Same
Application:
10/281,306 →
Semiconductor device with semiconductor layer having various thickness
Application:
10/277,821 →
Field-Effect Type Semiconductor Device for Power Amplifier
Application:
10/259,396 →
Semiconductor Device Having Thin Electrode Laye Adjacent Gate Insulator and Method of Manufacture
Application:
10/251,753 →
Semiconductor Device Including a Capacitance
Application:
10/216,722 →
Semiconductor Device
Application:
10/199,592 →
Semiconductor Device Having Offset Insulation Film Formed on Insulation Film, and Method of Manufacturing the Same
Application:
10/192,657 →
Manufacturing Method of Semiconductor Integrated Circuit Device, and Semiconductor Integrated Circuit Device
Application:
10/142,063 →
A Method of Producing a Semiconductor Device Having a Multi-Layered Insulation Film
Application:
10/135,393 →
Semiconductor Device and Flat Electrodes
Application:
10/106,491 →
Manufacturing Method of Semiconductor Device
Application:
10/090,626 →
Semiconductor Device
Application:
10/084,477 →
Method of Manufacturing Semiconductor Device, Nonvolatile Semiconductor Memory Device and Method of Manufacturing the Same
Application:
10/083,611 →
Semiconductor Memory Element, Semiconductor Device and Control Method Thereof
Application:
10/082,205 →
Method of Manufacturing a Semiconductor Memory Device Having a Capacitor with Improved Dielectric Layer
Application:
10/059,122 →
Semiconductor Device
Application:
10/050,951 →
Semiconductor Device
Application:
10/050,950 →
Method of Manufacturing Semiconductor Integrated Circuit Device
Application:
10/046,813 →
Semiconductor Device and Method of Manufacturing the Same
Application:
10/046,814 →
Semiconductor Device
Application:
10/046,230 →
Process for Manufacturing a Semiconductor Wafer, a Semiconductor Wafer, Process for Manufacturing a Semiconductor Integrated Circuit Device, and Semiconductor Integrated Circuit Device
Application:
10/014,405 →
Method of Making a Non-Volatile Memory and Semiconductor Device
Application:
10/011,731 →
Process for Manufacturing a Semiconductor Wafer, a Semiconductor Wafer, Process for Manufacturing a Semiconductor Integrated Circuit Device, and Semiconductor Integrated Circuit Device
Application:
10/002,147 →
Method of Manufacturing a Semiconductor Device
Application:
09/998,649 →
Methods of Processing Semiconductor Wafer and Producing Ic Card, and Carrier
Application:
09/991,747 →