Semiconductor device and method of manufacturing same
View Patent ↗A semiconductor device which achieves reductions in malfunctions and operating characteristic variations by reducing the gain of a parasitic bipolar transistor, and a method of manufacturing the same are provided. A silicon oxide film ( 6 ) is formed partially on the upper surface of a silicon layer ( 3 ). A gate electrode ( 7 ) of polysilicon is formed partially on the silicon oxide film ( 6 ). A portion of the silicon oxide film ( 6 ) underlying the gate electrode ( 7 ) functions as a gate insulation film. A silicon nitride film ( 9 ) is formed on each side surface of the gate electrode ( 7 ), with a silicon oxide film ( 8 ) therebetween. The silicon oxide film ( 8 ) and the silicon nitride film ( 9 ) are formed on the silicon oxide film ( 6 ). The width (W 1 ) of the silicon oxide film ( 8 ) in a direction of the gate length is greater than the thickness (T 1 ) of the silicon oxide film ( 6 ).
1. A semiconductor device comprising:
a substrate having a first region with a digital circuit formed therein, and a second region with an analog or RF (radio frequency) circuit formed therein;
a first semiconductor element formed in said first region and constituting said digital circuit; and
a second semiconductor element formed in said second region and constituting said analog or RF circuit,
said first semiconductor element including
a first gate electrode formed on a main surface of said substrate, with a first gate insulation film therebetween,
a first body region formed in said substrate under said first gate electrode, and
a pair of first source/drain regions formed in said substrate, with said first body region disposed between said pair of first source/drain regions,
said second semiconductor element including a second gate electrode formed on said main surface of said substrate, with a second gate insulation film therebetween,
a second body region formed in said substrate under said second gate electrode, and
a pair of second source/drain regions formed in said substrate, with said second body region disposed between said pair of second source/drain regions,
said pair of first source/drain regions having a pair of first extensions, respectively, extending toward under said first gate electrode in said main surface of said semiconductor layer,
said pair of second source/drain regions having a pair of second extensions, respectively, extending toward under said second gate electrode in said main surface of said semiconductor layer,
wherein the amount of overlap between said first gate electrode and said first extensions as viewed in plan is greater than the amount of overlap between said second gate electrode and said second extensions as viewed in plan.
2. The semiconductor device according to claim 1 , wherein
said first semiconductor element further includes a first sidewall formed on a side surface of said first gate electrode; and
said second semiconductor element further includes
a first insulation film formed on a side surface of said second gate electrode, and
a second sidewall formed on said side surface of said second gate electrode, with said first insulation film therebetween.
3. The semiconductor device according to claim 2 , wherein
said first semiconductor element further includes a second insulation film formed between said first gate electrode and said first sidewall, said second insulation film being in contact with said side surface of said first gate electrode; and
said first insulation film includes
a third insulation film formed in contact with said side surface of said second gate electrode, said third insulation film being equal in thickness to said second insulation film, and
a fourth insulation film formed between said third insulation film and said second sidewall.