Semiconductor device and method of manufacturing the same
View Patent ↗When a through-hole electrode and a rear-surface wire are formed on a rear surface of a chip, a convex portion is formed on the rear surface of the chip due to a rear-surface wiring pad which is a part of the through-hole electrode and the rear-surface wire. This causes the air leakage when the chip is sucked, and therefore, the reduction of the sucking force of the chip occurs. A concave portion is formed in advance in a region where a rear-surface wiring pad and a rear-surface wire are formed. The rear-surface wiring pad and the rear-surface wire are provided inside the concave portion. Thus, a flatness of the rear surface of the chip is ensured by a convex portion caused by thicknesses of the rear-surface wiring pad and the rear-surface wire, so that the reduction of the sucking force does not occur when the chip is handled.
1. A semiconductor device comprising:
a semiconductor substrate having a first surface and a second surface located on an opposite side to the first surface;
an interlayer insulating film formed on the first surface of the semiconductor substrate;
a first conductive film formed on the first surface of the semiconductor substrate via the interlayer insulating film;
a concave portion formed on the second surface of the semiconductor substrate;
a hole formed in a bottom surface of the concave portion and reaching the first conductive film;
an insulating film formed on the bottom surface of the concave portion; and
a second conductive film formed on the bottom surface of the concave portion via the insulating film and formed on a bottom surface of the hole so as to be electrically connected to the first conductive film,
the hole, the insulating film, and the second conductive film configuring a through-hole electrode, and
the through-hole electrode including:
a first hole which configures the hole and reaches the interlayer insulating film from the bottom surface of the concave portion;
a second hole which configures the hole and reaches the first conductive film from the bottom surface of the first hole, and whose hole diameter is smaller than that of the first hole;
the insulating film formed on the bottom surface and a side surface of the first hole; and
the second conductive film formed on the bottom surface and the side surface of the first hole and on the bottom surface of the concave portion via the insulating film, and formed on a bottom surface of the second hole so as to be electrically connected to the first conductive film.
2. The semiconductor device according to claim 1 , wherein
the second conductive film is placed inside the concave portion, and
the hole, the insulating film, and the second conductive film configure a through-hole electrode, and
the through-hole electrode includes:
a first hole which configures the hole and reaches the interlayer insulating film from the bottom surface of the concave portion, and whose bottom surface is located at a position closer to the first conductive film than a boundary between the interlayer insulating film and the semiconductor substrate;
a second hole which configures the hole and reaches the first conductive film from the bottom surface of the first hole, and whose hole diameter is smaller than that of the first hole;
the insulating film formed on the bottom surface and a side surface of the first hole and on the bottom surface of the concave portion; and
the second conductive film formed on the bottom surface and the side surface of the first hole and on the bottom surface of the concave portion via the insulating film, and formed on a bottom surface of the second hole so as to be electrically connected to the first conductive film.
3. The semiconductor device according to claim 1 , wherein
the through-hole electrode of the semiconductor substrate and a bump electrode of an other semiconductor substrate are geometrically caulked, so that the other semiconductor substrate is stacked on the second surface of the semiconductor substrate.
4. The semiconductor device according to claim 3 , wherein
the second conductive film on the bottom surface of the concave portion configures a wire electrically connected to the through-hole electrode, and
a three dimensional wire is configured of the through-hole electrode, the bump electrode, and the wire.
5. The semiconductor device according to claim 4 , wherein
the three dimensional wire configures a same potential line.
6. A manufacturing method of a semiconductor device comprising the steps of:
(a) preparing a semiconductor substrate having a first surface and a second surface located on an opposite side to the first surface;
(b) forming an interlayer insulating film on the first surface of the semiconductor substrate;
(c) forming a first conductive film on the first surface of the semiconductor substrate via the interlayer insulating film;
(d) forming a concave portion on the second surface of the semiconductor substrate;
(e) forming an insulating film on a bottom surface of the concave portion;
(f) forming a hole reaching the first conductive film in the bottom surface of the concave portion; and
(g) forming a second conductive film on the bottom surface of the concave portion via the insulating film and on a bottom surface of the hole so as to be electrically connected to the first conductive film;
wherein the hole, the insulating film, and the second conductive film configure a through-hole electrode;
(h) forming a first hole in the through-hole electrode which configures the hole and reaches the interlayer insulating film from the bottom surface of the concave portion;
(i) forming a second hole which configures the hole and reaches the first conductive film from the bottom surface of the first hole, and whose hole diameter is smaller than that of the first hole;
wherein, the insulating film is formed on the bottom surface and a side surface of the first hole; and
the second conductive film is formed on the bottom surface and the side surface of the first hole and on the bottom surface of the concave portion via the insulating film, and formed on a bottom surface of the second hole so as to be electrically connected to the first conductive film.
7. The manufacturing method of the semiconductor device according to claim 6 , wherein
in the step (d), the concave portion equal to or deeper than a thickness of the second conductive film is formed.
8. The manufacturing method of the semiconductor device according to claim 6 , wherein
in the step (g), a wire and a wiring pad configured of the second conductive film are simultaneously formed on the bottom surface of the concave portion.
9. The manufacturing method of the semiconductor device according to claim 6 , wherein
in the step (g), the second conductive film is formed by stacking a metal seed layer and a plating layer, and
after the step (f), the metal seed layer is formed on the bottom surface of the concave portion via the insulating film and formed so as to be electrically connected to the first conductive film on the bottom surface of the hole, and the plating layer is formed on the metal seed layer.
10. A manufacturing method of a semiconductor device comprising the steps of:
(a) preparing a semiconductor substrate having a main surface and a rear surface located on an opposite side to the main surface, and then, forming a semiconductor element on the main surface of the semiconductor substrate and forming an interlayer insulating film on the main surface of the semiconductor substrate;
(b) forming a main-surface wiring pad on the main surface of the semiconductor substrate via the interlayer insulating film;
(c) forming a first resist mask on the rear surface of the semiconductor substrate and forming a concave portion by etching on the semiconductor substrate with using the first resist mask, and then, removing the first resist mask;
(d) forming a second resist mask having an opening portion in a part of a bottom surface of the concave portion corresponding to a position of the main-surface wiring pad and forming a first hole by etching in the semiconductor substrate with using the second resist mask, and then, removing the second resist mask;
(e) forming an insulating film on the rear surface of the semiconductor substrate including an inside portion of the first hole;
(f) forming an aluminum film on the insulating film;
(g) after the step (f), forming a third resist mask having an opening portion in a part of the bottom surface of the first hole, removing each of the aluminum film, the insulating film, the semiconductor substrate, and the interlayer insulating film by etching with using the third resist mask, and forming a second hole reaching the main-surface wiring pad, and then, removing the third resist mask;
(h) forming a metal seed layer on a bottom surface and a side surface of each of the second hole, the first hole, and the concave portion and on the rear surface of the semiconductor substrate;
(i) forming a fourth resist mask having an opening portion in a part of the concave portion, the first hole, and the second hole and forming a plating layer on the metal seed layer by a plating method with using the fourth resist mask, and then, removing the fourth resist mask; and
(j) forming a fifth resist mask for covering the plating layer and removing a portion of the metal seed layer which is not covered by the fifth resist mask, thereby forming a rear-surface wiring pad configured of the metal seed layer and the plating layer on the bottom surface of the concave portion, and then, removing the fifth resist mask.