Electrostatic discharge device
View Patent ↗M pieces of n-well regions nW are provided on a main surface of a p-type silicon substrate 3 , and p-well regions pW are provided among the n-well regions adjacent to one another. Moreover, each of the M pieces of n-well regions nW includes an n-type diffusion region nD and a p-type diffusion region pD 1 , which are formed therein. Furthermore, the p-well region pW includes a p-type diffusion region pD 2 therein. The n-type diffusion region nD in a j-th of the n-well region nW is connected to the p-type diffusion region pD 1 in a (j+1)-th of the n-well region 10 . The p-type diffusion region pD 1 in the first n-well region nW is connected to a first terminal 1 . The n-type diffusion region nD in the M-th of the n-well region nW is connected to a second terminal 2 . In response to a potential relation between desired terminal to be protected (not depicted) and discharge terminal (not depicted) during a normal operation, the first terminal is connected to either one of the terminals, of which potential is higher, and the second terminal 2 is connected to the other of which potential is lower.
1. An electrostatic discharge device comprising:
a semiconductor substrate of a first conduction type;
first and second wells of a second conduction type opposite to said first conduction type, each of said first and second wells including a first diffusion region of said first conduction type and a second diffusion region of said second conduction type, said second diffusion region in said first well being connected to said first diffusion region in said second well; and
a third well of said first conduction type located between said first well and said second well, wherein said first, second and third wells cooperate with one another to perform a bipolar action;
a fourth well of said second conduction type including a first diffusion region of said first conduction type and a second diffusion region of said second conduction type, said first diffusion region in said fourth well being connected to said second diffusion region in said second well; and
a fifth well of said first conduction type located between said second well and said fourth well, wherein a voltage applied to said first diffusion region of said first well is higher than a voltage applied to said second diffusion region of said fourth well, and wherein said fifth well is free from a diffusion region of said first conductive type therein.
2. The electrostatic discharge device according to claim 1 , wherein said second, fourth and fifth well cooperate with one another to perform a bipolar action.
3. An electrostatic discharge device, comprising:
a semiconductor substrate of a first conduction type;
first and second wells of a second conduction type opposite to said first conduction type, each of said first and second wells including a first diffusion region of said first conduction type and a second diffusion region of said second conduction type, said second diffusion region in said first well being connected to said first diffusion region in said second well; and
a third well of said first conduction type formed between said first well and said second well and including a diffusion region of said first conduction type, wherein said diffusion region in said third well is divided into a plurality of portions, each of said portions being apart from each other.
4. The electrostatic discharge device according to claim 3 , wherein said diffusion region in said third well is exposed in a surface of said semiconductor substrate.
5. The electrostatic discharge device according to claim 3 , wherein said first, second and third wells cooperate with one another to perform a bipolar action.
6. The electrostatic discharge device according to claim 3 , further comprising:
a fourth well of said second conduction type including a first diffusion region of said first conduction type and a second diffusion region of said second conduction type, said first diffusion region in said fourth well being connected to said second diffusion region in said second well; and
a fifth well of said first conduction type located between said second well and said fourth well, wherein a voltage applied to said first diffusion region of said first well is higher than a voltage applied to said second diffusion region of said fourth well, and wherein said fifth well is free from a diffusion region of said first conductive type therein.
7. The electrostatic discharge device according to claim 6 , wherein said second, fourth and fifth well cooperate with one another to perform a bipolar action.
8. The electrostatic discharge device according to claim 3 , wherein said first and second wells are separated from said third well by shallow trench isolation.