Line profile asymmetry measurement using scatterometry
View Patent ↗A method of and apparatus for measuring line profile asymmetries in microelectronic devices comprising directing light at an array of microelectronic features of a microelectronic device, detecting light scattered back from the array comprising either or both of one or more angles of reflection and one or more wavelengths, and comparing one or more characteristics of the back-scattered light by examining data from complementary angles of reflection or performing a model comparison.
1. A method of measuring line profile asymmetries in microelectronic devices, the method comprising the steps of:
directing light at an array of microelectronic features of a microelectronic device;
detecting light scattered back from the array comprising one or more features selected from the group consisting of one or more angles of reflection and one or more wavelengths; and
comparing one or more characteristics of the back-scattered light by performing an operation comprising examining data from complementary angles of reflection.
2. The method of claim 1 wherein the directing step comprises directing light at substantially a single wavelength.
3. The method of claim 1 wherein the directing step comprises directing light at a plurality of wavelengths.
4. The method of claim 1 wherein the comparing step comprises comparing light intensity.
5. The method of claim 1 wherein the comparing step additionally comprises comparing phase.
6. The method of claim 1 wherein the comparing step additionally comprises comparing ratios of light magnitude and light phase.
7. The method of claim 1 , 2 or 3 wherein the directing step comprises directing light at an array of microelectronic features in general conical configuration.
8. The method of claim 1 , 2 or 3 wherein the directing and detecting steps are performed by an angular scatterometer.
9. The method of claim 1 , 2 or 3 wherein the directing and detecting steps are performed by a spectral scatterometer.
10. The method of claim 1 , 2 or 3 wherein the comparing step comprises decomposing back-scattered light into S and P components relative to a plane of incidence.
11. The method of claim 1 , 2 or 3 wherein the detecting step comprises detecting specular order diffracted light.
12. The method of claim 1 , 2 or 3 additionally comprising the step of employing the results of the comparing step to detect asymmetries selected from the group consisting of asymmetries within a single layer of the microelectronic device and asymmetries within multiple layers of the microelectronic device.
13. The method of claim 12 additionally comprising the step of controlling a manufacturing process if results of the comparing step indicate an asymmetry in the array.
14. An apparatus for measuring line profile asymmetries in microelectronic devices, said apparatus comprising:
means for directing light at an array of microelectronic features of a microelectronic device;
means for detecting light scattered back from the array comprising one or more features selected from the group consisting of one or more angles of reflection and one or more wavelengths; and
means for comparing one or more characteristics of the back-scattered light by performing an operation comprising examining data from complementary angles of reflection.
15. The apparatus of claim 14 wherein said directing means comprises means for directing light at substantially a single wavelength.
16. The apparatus of claim 14 wherein said directing means comprises means for directing light at a plurality of wavelengths.
17. The apparatus of claim 14 wherein said comparing means additionally comprises means for comparing light intensity.
18. The apparatus of claim 14 wherein said comparing means additionally comprises means for comparing phase.
19. The apparatus of claim 14 wherein said comparing means additionally comprises means for comparing ratios of light magnitude and light phase.
20. The apparatus of claim 14 , 15 or 16 wherein said directing means comprises means for directing light at an array of microelectronic features in general conical configuration.
21. The apparatus of claim 14 , 15 or 16 wherein said directing and detecting means comprise an angular scatterometer.
22. The apparatus of claim 14 , 15 or 16 wherein said directing and detecting means comprise a spectral scatterometer.
23. The apparatus of claim 14 , 15 or 16 wherein said comparing means comprises means for decomposing back-scattered light into S and P components relative to a plane of incidence.
24. The apparatus of claim 14 , 15 or 18 wherein said detecting means comprises means for detecting specular order diffracted light.
25. The apparatus of claim 14 , 15 or 16 additionally comprising means for employing the results of the comparing step to detect asymmetries selected from the group consisting of asymmetries within a single layer of the microelectronic device and asymmetries within multiple layers of the microelectronic device.
26. The apparatus of claim 25 additionally comprising means for controlling a manufacturing process if said comparing means indicates an asymmetry in the array.
27. A method of measuring line profile asymmetries in microelectronic devices, the method comprising the steps of:
directing light at an array of microelectronic features of a microelectronic device;
detecting light scattered back from the array comprising one or more features selected from the group consisting of one or more angles of reflection and one or mare wavelengths; and
comparing one or more characteristics of the back-scattered light by performing an operation comprising performing a model comparison with an asymmetric model.
28. The method of claim 27 wherein the directing step comprises directing light at substantially a single wavelength.
29. The method of claim 27 wherein the directing step comprises directing light at a plurality of wavelengths.
30. The method of claim 27 wherein the comparing step comprises comparing light intensity.
31. The method of claim 27 wherein the comparing step additionally comprises comparing phase.
32. The method of claim 27 wherein the comparing step additionally comprises comparing ratios of light magnitude and light phase.
33. The method of claim 27 wherein comparing comprises a model comparison with a library of asymmetric models.
34. The method of claim 27 wherein comparing comprises a model comparison by regression analysis with an asymmetric model.
35. The method of claim 27 , 28 or 29 wherein the directing step comprises directing light at an array of microelectronic features in general conical configuration.
36. The method of claim 27 , 28 or 29 wherein the directing and detecting steps are performed by an angular scatterometer.
37. The method of claim 27 , 28 or 29 wherein the directing and detecting steps are performed by a spectral scatterometer.
38. The method of claim 27 , 28 or 29 wherein the comparing step comprises decomposing back-scattered light into S and P components relative to a plane of incidence.
39. The method of claim 27 , 28 or 29 wherein the detecting step comprises detecting specular order diffracted light.
40. The method of claim 27 , 28 or 29 additionally comprising the step of employing the results of the comparing step to detect asymmetries selected from the group consisting of asymmetries within a single layer of the microelectronic device and asymmetries within multiple layers of the microelectronic device.
41. The method of claim 40 additionally comprising the step of controlling a manufacturing process if results of the comparing step indicate an asymmetry in the array.
42. An apparatus for measuring line profile asymmetries in microelectronic devices, said apparatus comprising:
means for directing light at an array of microelectronic features of a microelectronic device;
means for detecting light scattered back from the array comprising one or more features selected from the group consisting of one or more angles of reflection and one or more wavelengths; and
means for comparing one or more characteristics of the back-scattered light by performing an operation comprising performing a model comparison with an asymmetric model.
43. The apparatus of claim 42 wherein said directing means comprises means for directing light at substantially a single wavelength.
44. The apparatus of claim 42 wherein said directing means comprises means for directing light at a plurality of wavelengths.
45. The apparatus of claim 42 wherein said comparing means additionally comprises means for comparing light intensity.
46. The apparatus of claim 42 wherein said comparing means additionally comprises means for comparing phase.
47. The apparatus of claim 42 wherein said comparing means additionally comprises means for comparing ratios of light magnitude and light phase.
48. The apparatus of claim 42 wherein said means for comparing comprises a model comparison with a library of asymmetric models.
49. The apparatus of claim 42 wherein said means for comparing comprises a model comparison by regression analysis with an asymmetric model.
50. The apparatus of claim 42 , 43 or 44 wherein said directing means comprises means for directing light at an array of microelectronic features in general conical configuration.
51. The apparatus of claim 42 , 43 or 44 wherein said directing and detecting means comprise an angular scatterometer.
52. The apparatus of claim 42 , 43 or 44 wherein said directing and detecting means comprise a spectral scatterometer.
53. The apparatus of claim 42 , 43 or 44 wherein said comparing means comprises means for decomposing back-scattered light into S and P components relative to a plane of incidence.
54. The apparatus of claim 42 , 43 or 44 wherein said detecting means comprises means for detecting specular order diffracted light.
55. The apparatus of claim 42 , 43 or 44 additionally comprising means for employing the results or the comparing step to detect asymmetries selected from the group consisting of asymmetries within a single layer of the microelectronic device and asymmetries within multiple layers of the microelectronic device.
56. The apparatus of claim 55 additionally comprising means for controlling a manufacturing process if said comparing means indicates an asymmetry in the array.