IP Library Granted Patent US 6,861,008
Granted Patent B1
US 6,861,008 · App. 10/089,308 · Granted Mar 1, 2005

Method and device for laser drilling organic materials

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Quick Facts
Patent No.
US 6,861,008
App. No.
10/089,308
Granted
Mar 1, 2005
Kind
B1
Abstract

For the laser drilling of organic materials, in particular for making blind holes in dielectric layers, a frequency-doubled Nd-vanadate laser with the following parameters is used: pulse width <40 ns pulse frequency ≧20 kHz wavelength =532 nm.

Claims (65)

1. A method for laser drilling of organic materials, comprising:

using a frequency-doubled Nd-vanadate laser for the laser drilling, wherein the laser includes the following laser parameters,

pulse width

<40

ns,

pulse frequency

≧20

kHz, and

wavelength

=532

nm.

2. The method as claimed in claim 1 , wherein a laser pulse width of <30 ns is used.

3. The method as claimed in claim 1 , wherein a focused laser beam with a spot diameter of between 10 μm and 100 μm is used.

4. The method as claimed in claim 3 , wherein a focused laser beam with a spot diameter of between 20 μm and 40 μm is used.

5. The method as claimed in claim 1 , wherein additives which absorb laser beams with a wavelength of 532 nm are admixed with the organic material.

6. The method as claimed in claim 5 , wherein at least one of an inorganic pigment, an organic pigment, at least one polymer-soluble dye and at least one fibrous filler is used as the additive.

7. The method as claimed in claim 6 , wherein at least one of an inorganic red pigment and one organic red pigment and one polymer-soluble red dye is used as the additive.

8. The method as claimed in claim 6 , wherein between 0.1% by weight and 5.0% by weight of pigments are admixed with the organic material.

9. The method as claimed in claim 6 , wherein between 1% by weight and 2% by weight of pigments are admixed with the organic material.

10. The method as claimed in claim 5 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 50% for the wavelength 532 nm of the laser radiation.

11. The method as claimed in claim 5 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 60% for the wavelength 532 nm of the laser radiation.

12. The method as claimed in claim 5 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 80% for the wavelength 532 nm of the laser radiation.

13. A device for the laser drilling of organic materials, comprising:

a frequency-doubled Nd-vanadate laser with the following laser parameters,

pulse width

<40

ns,

pulse frequency

≧20

kHz, and

wavelength

=532

nm.

.

14. The method as claimed in claim 2 , wherein a focused laser beam with a spot diameter of between 10 μm and 100 μm is used.

15. The method as claimed in claim 14 , wherein a focused laser beam with a spot diameter of between 20 μm and 40 μm is used.

16. The method as claimed in claim 7 , wherein between 0.1% by weight and 5.0% by weight of pigments are admixed with the organic material.

17. The method as claimed in claim 7 , wherein between 1% by weight and 2% by weight of pigments are admixed with the organic material.

18. The method as claimed in claim 6 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 50% for the wavelength 532 nm of the laser radiation.

19. The method as claimed in claim 7 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 50% for the wavelength 532 nm of the laser radiation.

20. The method as claimed in claim 8 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 50% for the wavelength 532 nm of the laser radiation.

21. The method as claimed in claim 9 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 50% for the wavelength 532 nm of the laser radiation.

22. The method as claimed in claim 6 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 60% for the wavelength 532 nm of the laser radiation.

23. The method as claimed in claim 7 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 60% for the wavelength 532 mm of the laser radiation.

24. The method as claimed in claim 8 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 60% for the wavelength 532 nm of the laser radiation.

25. The method as claimed in claim 9 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 60% for the wavelength 532 nm of the laser radiation.

26. The method as claimed in claim 6 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 80% for the wavelength 532 nm of the laser radiation.

27. The method as claimed in claim 7 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 80% for the wavelength 532 nm of the laser radiation.

28. The method as claimed in claim 8 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 80% for the wavelength 532 nm of the laser radiation.

29. The method as claimed in claim 9 , wherein the organic material has, as a result of the admixing of the additives, a degree of absorption of at least 80% for the wavelength 532 nm of the laser radiation.

30. A method for laser drilling of metallic materials, comprising:

using a frequency doubled Nd-vanadate laser for the laser drilling, wherein the laser includes the following laser parameters:

pulse width < 40 ns,

pulse frequency ≧ 30 kHz, and

wavelength = 532 nm.

31. The method as claimed in claim 30 , wherein a laser pulse width of less than 30 ns is used.

32. The method as claimed in claim 30 , wherein a focused laser beam with a spot diameter of between 10 μm and 100 μm is used.

33. The method as claimed in claim 32 , wherein a focused laser beam with a spot diameter with 20 μm and 40 μm is used.

34. A device for the laser drilling of metallic materials comprising:

a frequency doubled Nd-vanadate laser with the following laser parameters:

pulse width < 40 ns.

pulse frequency ≧ 30 kHz, and

wavelength = 532 nm.

35. The method as claimed in claim 34 , wherein a focused laser beam with a spot diameter of between 10 μm and 100 μm is used.

36. The method as claimed in claim 35 , wherein a focused laser beam with a spot diameter with 20 μm and 40 μm is used.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 13, 2006
From: SIEMENS AKTIENGESELLSCHAFT
To: HITACHI VIA MECHANICS, LTD.
Reel/Frame 017666/0270 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2006
From: SIEMENS AKTIENGESELLSCHAFT
To: HITACHI VIA MECHANICS, LTD.
Reel/Frame 017198/0048 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 29, 2002
From: DE STEUR, HUBERT; HEERMAN, MARCEL; VAN PUYMBROECK, JOZEF
To: SIEMENS AKTIENGESELLSCHAFT
Reel/Frame 012988/0522 →