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App. No. 10/126,626 · Confirmation No. 3699

METHOD FOR DESIGNING PHOTOLITHOGRAPHIC RETICLE LAYOUT, RETICLE, AND PHOTOLITHOGRAPHIC PROCESS

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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2007-05-29 EBCC.AD Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update 1 View
2003-07-11 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-07-10 TRNA Transmittal of New Application 3 View
2002-07-10 SPEC Specification 31 View
2002-07-10 CLM Claims 22 View
2002-07-10 ABST Abstract 1 View
2002-07-10 LET. Miscellaneous Incoming Letter 1 View
2002-04-22 TRNA Transmittal of New Application 2 View
2002-04-22 A.PE Preliminary Amendment 4 View
2002-04-22 SPEC Specification 31 View
2002-04-22 CLM Claims 22 View
2002-04-22 ABST Abstract 1 View
2002-04-22 DRW Drawings-only black and white line drawings 24 View
2002-04-22 OATH Oath or Declaration filed 3 View
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Quick Facts
App. No.
10/126,626
Filed
2002-04-22
Granted
2003-09-16
Pub. No.
US20020160278A1
Art Unit
1756
PTA
-50 days