Centrifugal dryer, manufacturing method for semiconductor device and semiconductor manufacturing apparatus
View Patent ↗A centrifugal dryer of the present invention includes: a chamber for performing drying processing for plural substrates; a cradle, installed inside chamber, and drying plural substrates by rotation driving in a state of being held therein; and an elastic wave sensor for detecting an elastic wave generating upon striking of a chip from plural substrates to said chamber during the processing therefor.
1. A centrifugal dryer comprising:
a chamber for performing drying processing for plural substrates;
a rotary object, installed inside said chamber, and drying said substrates by rotation driving in a state of being held therein; and
elastic wave detection means for detecting an elastic wave transmitted along a wall of said chamber, the elastic wave generating upon striking of a chip from said substrates to said chamber during said processing said substrates, wherein
the elastic wave detection means uses a speed component having a resonance point in the frequency range of 50 kHz to 500 kHz.
2. A centrifugal dryer comprising:
a chamber for performing drying processing for plural substrates;
a rotary object, installed inside said chamber, and drying said substrates by rotation driving in a state of being held therein; and
elastic wave detection means for detecting an elastic wave generating upon striking of a chip from said substrates to said chamber during said processing said substrates, wherein said elastic wave detection means includes an elastic wave detection sensor, and said elastic wave detection sensor is installed on an outside wall of said chamber.
3. The centrifugal dryer according to claim 2 , further comprising: elastic wave detection frequency adjustment means adjusting a detection frequency for said elastic wave.
4. The centrifugal dryer according to claim 2 wherein a detection frequency for said elastic wave is variable in the range of from 50 kHz to 500 kHz.
5. The centrifugal dryer according to claim 2 , wherein a detection frequency region for said elastic wave is set in advance.
6. The centrifugal dryer according to claim 2 , further comprising: an arithmetic-logic section inputted with a signal from said elastic wave detection means to output detection of an anomaly.
7. The centrifugal dryer according to claim 6 , further comprising: announcement means announcing an error upon detection of an anomaly.
8. The centrifugal dryer according to claim 6 , further comprising: substrate processing interruption means for interrupting processing of said substrates upon detection of an anomaly.
9. A manufacturing method for a semiconductor device, characterized by performing drying processing for a substrate using a centrifugal dryer according to claim 1 .
10. A semiconductor manufacturing apparatus comprising:
a chamber for performing processing for a substrate;
substrate processing means, installed inside said chamber, and for performing said processing for said substrate; and
elastic wave detection means for detecting an elastic wave transmitted along a wall of said chamber, the elastic wave generating upon striking of a chip from said substrate to said chamber during said processing for said substrate, wherein the elastic wave detection means includes an elastic wave detection sensor, and said elastic wave detection sensor is installed on an outside wall of said chamber.