Patent Application
Utility
App. No. 10/134,381
· Confirmation No. 4289
High purity gallium for producing compound semiconductor, refining process and apparatus for the same
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-04-30 | TRNA |
Transmittal of New Application | 3 | View | |
| 2002-04-30 | ADS |
Application Data Sheet | 5 | View | |
| 2002-04-30 | SPEC |
Specification | 60 | View | |
| 2002-04-30 | CLM |
Claims | 5 | View | |
| 2002-04-30 | ABST |
Abstract | 1 | View | |
| 2002-04-30 | DRW |
Drawings-only black and white line drawings | 7 | View | |
| 2002-04-30 | OATH |
Oath or Declaration filed | 3 | View |
Inventors
Takeharu Yamamura
Hachiouji-shi, JAPAN
Hidekazu Kato
Funabashi-shi, JAPAN
Takashi Ohgami
Edogawa-ku, JAPAN
Kishio Tayama
Akita-ken, JAPAN
Kanichi Okuda
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
75/688
C22B58/00
Y02P10/20
C22B9/02
C22B9/14
Prosecution
- Examiner
- KASTLER, SCOTT R
- Art Unit
- 1742
- Docket No.
- 50232-068
- Confirmation No.
- 4289
Foreign Priority
10-309144
·
1998-10-29
·
JAPAN
Publication
- Pub. No.
- US20020162419A1
- Pub. Date
- 2002-11-07
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2008-01-07
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Quick Facts
- App. No.
- 10/134,381
- Filed
- 2002-04-30
- Pub. No.
- US20020162419A1
- Examiner
- KASTLER, SCOTT R
- Art Unit
- 1742
External Links