Beam shaping element for use in a lithographic system
View Patent ↗A beam homogenizer that minimizes undesired intensity variations at the output plane caused by sharp breaks between facets in previous embodiments. The homogenizer includes a hologram made up of irregularly patterned diffractive fringes. An input beam illuminates at least part of the hologram. The hologram transmits a portion of the input beam onto an output plane. In doing so, the energy of the input beam is spatially redistributed at the output plane into a homogenized output beam having a preselected spatial energy distribution at the output plane. Thus, the illuminated portion of the output plane has a shape predetermined by the designer of the homogenizer.
1. A beam shaping element for use in a lithographic system, the element comprising:
a substrate having on its surface a lithographically created structure, said lithographically created structure converting an in input beam into an output beam having a preselected angular energy distribution in a plane of the lithographic system, where the structure generates the angular energy distribution by having varying spatial frequency structures, where the substrate is divided in to a plurality of facet areas, a facet area being defined as a region large enough to contain substantially all of the spatial frequency content of the entire preselected angular energy distribution in the plane, and where, at each point in the plane, light contributing to each point comes from at least two facet areas of the plurality of facet areas.
2. The element of claim 1 , wherein the angular distribution is determined by the Fourier transform of the phase profile.
3. The element of claim 1 , wherein a Fourier transform of each facet area will give a desired output plane profile.
4. The element of claim 1 , wherein light comes from a sufficient number of facets of said plurality of facets, such that the beam is homogenized in the plane.
5. The element of claim 1 , wherein the angular energy distribution is substantially independent of fluctuations in spatial energy distribution of the input beam.
6. The element of claim 1 , wherein a majority of the beam is non-orthogonally incident on the plane.