Gas analyzing method and gas analyzer for semiconductor treater
View Patent ↗A gas analyzer for a semiconductor treater improved to be capable of monitoring leakage or change of gas composition influencing treatability of the semiconductor treater in situ is provided. A duct is provided on the outer wall of a chamber of the semiconductor treater for taking out gas to be analyzed from the chamber. A gas analytic chamber stores the gas to be analyzed taken out through the duct. A discharge formation part is mounted in the vicinity of the gas analytic chamber. The discharge formation part includes a high frequency generation coil generating a high frequency and forming a plasma of the gas to be analyzed in the gas analytic chamber. This gas analyzer further comprises a spectrometer analyzing the emission wavelength of the plasma of the gas to be analyzed.
1. A gas analyzing method for a semiconductor treater comprising steps of:
taking out gas to be analyzed from a chamber of said semiconductor treater;
storing said gas to be analyzed in a gas analytic chamber;
feeding a high frequency into said gas analytic chamber from outside said gas analytic chamber for forming a plasma in said gas analytic chamber; and
analyzing the emission spectrum of said plasma.
2. The gas analyzing method for a semiconductor treater according to claim 1 , performing said analysis in situ without stopping said semiconductor treater.
3. The gas analyzing method for a semiconductor treater according to claim 1 , performing said analysis before product treatment in said semiconductor treater.
4. The gas analyzing method for a semiconductor treater according to claim 1 , further comprising steps of:
preparing a calibration plasma generation chamber independently of said gas analytic chamber and filling up said calibration plasma generation chamber with known gas, and
generating a plasma of said known gas in said calibration plasma generation chamber,
for comparing the emission spectrum of said plasma of said gas to be analyzed with the emission spectrum of said plasma of said known gas and analyzing said gas to be analyzed.
5. The gas analyzing method for a semiconductor treater according to claim 4 , wherein
said known gas contains molecules or atoms forming the atmosphere.
6. The gas analyzing method for a semiconductor treater according to claim 4 , introducing specific gas having no emission spectrum data and allowing no general emission spectral analysis as said known gas,
for comparing the emission spectrum of said plasma of said gas to be analyzed with the emission spectrum of a plasma of said specific gas thereby checking inclusion of said specific gas in said chamber of said semiconductor treater.